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Ti-HMS分子筛的合成和气相硅烷化 被引量:8
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作者 李学峰 高焕新 +2 位作者 金国杰 丁琳 陈庆龄 《石油化工》 EI CAS CSCD 北大核心 2007年第5期441-446,共6页
以工业级正十六胺为模板剂,采用水热法合成了不同Ti含量的Ti-HMS分子筛,并用六甲基二硅氮烷对其进行气相硅烷化。采用X射线衍射、N2吸附、傅里叶变换红外光谱、交叉极化/魔角旋转29Si核磁共振、紫外-可见光谱和电感耦合等离子体原子发... 以工业级正十六胺为模板剂,采用水热法合成了不同Ti含量的Ti-HMS分子筛,并用六甲基二硅氮烷对其进行气相硅烷化。采用X射线衍射、N2吸附、傅里叶变换红外光谱、交叉极化/魔角旋转29Si核磁共振、紫外-可见光谱和电感耦合等离子体原子发射光谱(ICP-AES)对试样进行了表征。以过氧化氢异丙苯(CHP)为氧化剂,用环己烯的环氧化反应考察了Ti-HMS分子筛的催化性能。实验结果表明,合成的Ti-HMS分子筛试样具有典型的六方介孔特征,Ti主要以骨架四配位状态存在,硅烷化显著增加了Ti-HMS分子筛表面的疏水性。以不同Ti含量的Ti-HMS分子筛为催化剂,产物环氧环己烷(CHO)的选择性都超过90%,以凝胶中n(Si)∶n(Ti)=50时所合成的Ti-HMS分子筛为催化剂CHP转化率最高(75.9%)。以硅烷化后的Ti-HMS分子筛为催化剂,CHP转化率和CHO选择性有较大幅度的提高,分别达到80.3%和97.8%。 展开更多
关键词 Ti—HMS分子筛 气相硅烷化 环己烯 过氧氢异丙苯 环氧
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Chemical vapor deposition of SiC at different molar ratios of hydrogen to methyltrichlorosilane 被引量:1
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作者 杨艳 张伟刚 《Journal of Central South University》 SCIE EI CAS 2009年第5期730-737,共8页
Chemical vapor deposition(CVD) of SiC from methyltrichlorosilane(MTS) was studied at two different molar ratios of H2 to MTS(n(H2) /n(MTS) ) . The total pressure was kept as 100 kPa and the temperature was varied from... Chemical vapor deposition(CVD) of SiC from methyltrichlorosilane(MTS) was studied at two different molar ratios of H2 to MTS(n(H2) /n(MTS) ) . The total pressure was kept as 100 kPa and the temperature was varied from 850 to 1 100 ℃ at a total residence time of 1 s. Steady-state deposition rates as functions of reactor length and of temperature,investigated at different n(H2) /n(MTS) values,show that hydrogen exhibits strongly influences on the deposition rate. Especially,the deposition of Si co-deposit can be obtained in broader substrate length and at higher temperatures with increasing hydrogen partial pressure. Influence of hydrogen on the deposition process was also studied using gas phase composition and deposit composition analysis at various n(H2) /n(MTS) . SEM micrographs directly show the variation of surface morphologies at various n(H2) /n(MTS) . It can be found that the crystal grain of the deposit at 1 100 ℃ is better developed and the crystallization is also improved with increasing n(H2) /n(MTS) . 展开更多
关键词 METHYLTRICHLOROSILANE silicon carbide H2 MTS
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