Laser processing provides highly-controlled modification and on-demand fabrication of plasmon metal nanostructures for light absorption and photothermal convention.We present the laser-induced forward tansfer(LIFT)fab...Laser processing provides highly-controlled modification and on-demand fabrication of plasmon metal nanostructures for light absorption and photothermal convention.We present the laser-induced forward tansfer(LIFT)fabrication of silver nanomembranes in control of light absorption.By varying the hatch distance,different morphologies of randomly distributed plasmon silver nanostructures were produced,leading to well-controlled light absorption levels from 11%to 81%over broadband.The anti-reflection features were maintained below 17%.Equilibrated and plain absorptions were obtained throughout all absorption levels with a maximum intensity fluctuation of±8.5%for the 225μJ cases.The 45μJ pulse energy can offer a highly equilibrated absorption at a 60%absorption level with an intensity fluctuation of±1%.Pattern transfer was also achieved on a thin tape surface.The laser-transferred characters and patterns demonstrate a localized temperature rise.A rapid temperature rising of roughly 15℃can be achieved within 1 s.The LIFT process is highly efficiently fabricated with a typical speed value of 10^(3)to 10^(5)cm^(2)/h.The results indicated that LIFT is a well-controlled and efficient method for the production of optical films with specific absorption levels.展开更多
基金Projects(61704090, 11904177) supported by the National Natural Science Foundation of ChinaProject(KFJJ20210205) supported by the National and Local Joint Engineering Laboratory of RF Integration and Micro-Assembly Technology,Nanjing University of Posts and Telecommunications,China。
文摘Laser processing provides highly-controlled modification and on-demand fabrication of plasmon metal nanostructures for light absorption and photothermal convention.We present the laser-induced forward tansfer(LIFT)fabrication of silver nanomembranes in control of light absorption.By varying the hatch distance,different morphologies of randomly distributed plasmon silver nanostructures were produced,leading to well-controlled light absorption levels from 11%to 81%over broadband.The anti-reflection features were maintained below 17%.Equilibrated and plain absorptions were obtained throughout all absorption levels with a maximum intensity fluctuation of±8.5%for the 225μJ cases.The 45μJ pulse energy can offer a highly equilibrated absorption at a 60%absorption level with an intensity fluctuation of±1%.Pattern transfer was also achieved on a thin tape surface.The laser-transferred characters and patterns demonstrate a localized temperature rise.A rapid temperature rising of roughly 15℃can be achieved within 1 s.The LIFT process is highly efficiently fabricated with a typical speed value of 10^(3)to 10^(5)cm^(2)/h.The results indicated that LIFT is a well-controlled and efficient method for the production of optical films with specific absorption levels.
