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Double-gate tunnel field-effect transistor:Gate threshold voltage modeling and extraction
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作者 李妤晨 张鹤鸣 +3 位作者 胡辉勇 张玉明 王斌 周春宇 《Journal of Central South University》 SCIE EI CAS 2014年第2期587-592,共6页
The tunnel field-effect transistor(TFET) is a potential candidate for the post-CMOS era.As one of the most important electrical parameters of a device,double gate TFET(DG-TFET) gate threshold voltage was studied.First... The tunnel field-effect transistor(TFET) is a potential candidate for the post-CMOS era.As one of the most important electrical parameters of a device,double gate TFET(DG-TFET) gate threshold voltage was studied.First,a numerical simulation study of transfer characteristic and gate threshold voltage in DG-TFET was reported.Then,a simple analytical model for DG-TFET gate threshold voltage VTG was built by solving quasi-two-dimensional Poisson equation in Si film.The model as a function of the drain voltage,the Si layer thickness,the gate length and the gate dielectric was discussed.It is shown that the proposed model is consistent with the simulation results.This model should be useful for further investigation of performance of circuits containing TFETs. 展开更多
关键词 tunnel field-effect transistor gated P-I-N diode threshold voltage modeling EXTRACTION
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