A new type of 785 nm semiconductor laser device has been proposed.The thin cladding and mode expansion layer structure incorporated into the epitaxy on the p-side significantly impacts the regulation of grating etchin...A new type of 785 nm semiconductor laser device has been proposed.The thin cladding and mode expansion layer structure incorporated into the epitaxy on the p-side significantly impacts the regulation of grating etching depth.Thinning of the p-side waveguide layer makes the light field bias to the n-side cladding layer.By coordinating the confinement effect of the cladding layer,the light confinement factor on the p-side is regulated.On the other hand,the introduction of a mode expansion layer facilitates the expansion of the mode profile on the p side cladding layer.Both these factors contribute positively to reducing the grating etching depth.Compared to the reported epitaxial structures of symmetric waveguides,the new structure significantly reduces the etching depth of the grating while ensuring adequate reflection intensity and maintaining resonance.Moreover,to improve the output performance of the device,the new epitaxial structure has been optimized.Based on the traditional epitaxial structure,an energy release layer and an electron blocking layer are added to improve the electronic recombination efficiency.This improved structure has an output performance comparable to that of a symmetric waveguide,despite being able to have a smaller gain area.展开更多
Additive manufacturing(AM),also known as 3D-printing(3DP)technology,is an advanced manufacturing technology that has developed rapidly in the past 40 years.However,the ceramic material printing is still challenging be...Additive manufacturing(AM),also known as 3D-printing(3DP)technology,is an advanced manufacturing technology that has developed rapidly in the past 40 years.However,the ceramic material printing is still challenging because of the issue of cracking.Indirect 3D printing has been designed and drawn attention because of its high manufacturing speed and low cost.Indirect 3D printing separates the one-step forming process of direct 3D printing into binding and material sintering,avoiding the internal stress caused by rapid cooling,making it possible to realize the highquality ceramic component with complex shape.This paper presents the research progress of leading indirect 3D printing technologies,including binder jetting(BJ),stereolithography(SLA),and fused deposition modeling(FDM).At present,the additive manufacturing of ceramic materials is mainly achieved through indirect 3D printing technology,and these materials include silicon nitride,hydroxyapatite functional ceramics,silicon carbide structural ceramics.展开更多
By means of the pore-level simulation, the characteristics of gas-water flow and gas-water distribution during the alternative displacement of gas and water were observed directly from etched-glass micromodel. The res...By means of the pore-level simulation, the characteristics of gas-water flow and gas-water distribution during the alternative displacement of gas and water were observed directly from etched-glass micromodel. The results show that gas-water distribution styles are divided into continuous phase type and separate phase type. The water lock exists in pore and throat during the process of gas-water displacement, and it reduces the gas flow-rate and has some effects on the recovery efficiency during the operation of gas storage. According to the experimental results of aquifer gas storage in X area, the differences in available extent among reservoirs are significant, and the availability of pore space is 33% 45%.展开更多
Lithography is one of the most important and complicated key equipment for the integr ated circuit man ufacture.The 2一D positioning device is the importan t subsystem of lithography.Compared with conventional 2一D po...Lithography is one of the most important and complicated key equipment for the integr ated circuit man ufacture.The 2一D positioning device is the importan t subsystem of lithography.Compared with conventional 2一D positioning systems with cumbersome stacked arrangement,the 2-D positioning systems with planar motors have received increasing attention recently.Currently,many types of planar motors have been proposed.展开更多
Here we report a femtosecond laser direct writing(a precise 3D printing also known as two-photon polymerization lithography) of hybrid organic-inorganic SZ2080^(TM)pre-polymer without using any photo-initiator and app...Here we report a femtosecond laser direct writing(a precise 3D printing also known as two-photon polymerization lithography) of hybrid organic-inorganic SZ2080^(TM)pre-polymer without using any photo-initiator and applying ~100 fs oscillator operating at 517 nm wavelength and 76 MHz repetition rate. The proof of concept was experimentally demonstrated and benchmarking 3D woodpile nanostructures, micro-scaffolds, free-form micro-object “Benchy” and bulk micro-cubes are successfully produced. The essential novelty underlies the fact that non-amplified laser systems delivering just 40-500 p J individual pulses are sufficient for inducing localized cross-linking reactions within hundreds of nanometers in cross sections. And it is opposed to the prejudice that higher pulse energies and lower repetition rates of amplified lasers are necessary for structuring non-photosensitized polymers. The experimental work is of high importance for fundamental understanding of laser enabled nanoscale 3D additive manufacturing and widens technology’ s field of applications where the avoidance of photo-initiator is preferable or is even a necessity, such as micro-optics, nano-photonics, and biomedicine.展开更多
To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography pr...To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.展开更多
Twelve samples with periodic array square pillars microstructure were prepared on the silicon wafer by plasma etching techniques, on which space b of the square pillars increased from 5 to 60 μm. In order to study th...Twelve samples with periodic array square pillars microstructure were prepared on the silicon wafer by plasma etching techniques, on which space b of the square pillars increased from 5 to 60 μm. In order to study the effect ofb on the wettability of the rough surface, the effects of apparent contact angle （CA） and sliding angle （a） of the droplet on the rough surface were measured with the contact angle meter. The results show that the experimental values of CA well agree with the classical wetting theory and a decreases with the increase of b. Two drop shapes exist on the samples＇ surface, corresponding to the Cassie state and the Wenzel state respectively. The contact state in which a drop would settle depends typically on the size of b. On the role of gravitation, the irreversible transition of a drop from Cassie state to Wenzel state should occur at a certain space of the square pillars. Since the transition has implications on the application of super-hydrophobic rough surfaces, theoretically, the prediction of wetting state transition on square pillar array micro-structured surfaces provides an intuitionistic guidance for the design of steady superhydrophobic surfaces.展开更多
Electron beam lithography(EBL) is a key technology in the fabrication of nanoscale silicon optical waveguide. The influence of exposure dose, the main process parameter of EBL, on the structure profile of poly-methyl ...Electron beam lithography(EBL) is a key technology in the fabrication of nanoscale silicon optical waveguide. The influence of exposure dose, the main process parameter of EBL, on the structure profile of poly-methyl methacrylate(PMMA) after development was studied using a silicon on insulator(SOI) wafer with 220 nm top silicon as the substrate. The relationship between exposure dose and structure pattern width after development was analyzed according to the measurement results. The optimum exposure dose of 220 μC/cm^(2) was found to obtain a final structure consistent with the designed mask value through subsequent processes. At the same time, according to the image segmentation curve tracking technology, the contour extraction process of the dose test results was carried out, and the relationship among mask design value, exposure dose and two-dimensional roughness of boundary contour was analyzed, which can provide reference for the subsequent electron beam lithography of the same substrate material.展开更多
文摘A new type of 785 nm semiconductor laser device has been proposed.The thin cladding and mode expansion layer structure incorporated into the epitaxy on the p-side significantly impacts the regulation of grating etching depth.Thinning of the p-side waveguide layer makes the light field bias to the n-side cladding layer.By coordinating the confinement effect of the cladding layer,the light confinement factor on the p-side is regulated.On the other hand,the introduction of a mode expansion layer facilitates the expansion of the mode profile on the p side cladding layer.Both these factors contribute positively to reducing the grating etching depth.Compared to the reported epitaxial structures of symmetric waveguides,the new structure significantly reduces the etching depth of the grating while ensuring adequate reflection intensity and maintaining resonance.Moreover,to improve the output performance of the device,the new epitaxial structure has been optimized.Based on the traditional epitaxial structure,an energy release layer and an electron blocking layer are added to improve the electronic recombination efficiency.This improved structure has an output performance comparable to that of a symmetric waveguide,despite being able to have a smaller gain area.
基金Project(51901020)supported by the National Natural Science Foundation of ChinaProject(2019JZZY010327)supported by Shandong Key Research and Development Plan,China+1 种基金Project(201942074001)supported by Aeronautical Science Foundation of ChinaProject(FRF-IP-20-05)supported by the Fundamental Research Funds for the Central Universities,China。
文摘Additive manufacturing(AM),also known as 3D-printing(3DP)technology,is an advanced manufacturing technology that has developed rapidly in the past 40 years.However,the ceramic material printing is still challenging because of the issue of cracking.Indirect 3D printing has been designed and drawn attention because of its high manufacturing speed and low cost.Indirect 3D printing separates the one-step forming process of direct 3D printing into binding and material sintering,avoiding the internal stress caused by rapid cooling,making it possible to realize the highquality ceramic component with complex shape.This paper presents the research progress of leading indirect 3D printing technologies,including binder jetting(BJ),stereolithography(SLA),and fused deposition modeling(FDM).At present,the additive manufacturing of ceramic materials is mainly achieved through indirect 3D printing technology,and these materials include silicon nitride,hydroxyapatite functional ceramics,silicon carbide structural ceramics.
基金Project(2011ZX05013-002)supported by National Science and Technology Major Projects of China
文摘By means of the pore-level simulation, the characteristics of gas-water flow and gas-water distribution during the alternative displacement of gas and water were observed directly from etched-glass micromodel. The results show that gas-water distribution styles are divided into continuous phase type and separate phase type. The water lock exists in pore and throat during the process of gas-water displacement, and it reduces the gas flow-rate and has some effects on the recovery efficiency during the operation of gas storage. According to the experimental results of aquifer gas storage in X area, the differences in available extent among reservoirs are significant, and the availability of pore space is 33% 45%.
文摘Lithography is one of the most important and complicated key equipment for the integr ated circuit man ufacture.The 2一D positioning device is the importan t subsystem of lithography.Compared with conventional 2一D positioning systems with cumbersome stacked arrangement,the 2-D positioning systems with planar motors have received increasing attention recently.Currently,many types of planar motors have been proposed.
基金Project(S-MIP-20-17) supported by the Research Council of LithuaniaProject(871124) supported by the EU Horizon 2020, Research and Innovation program LASERLAB-EUROPE JRA。
文摘Here we report a femtosecond laser direct writing(a precise 3D printing also known as two-photon polymerization lithography) of hybrid organic-inorganic SZ2080^(TM)pre-polymer without using any photo-initiator and applying ~100 fs oscillator operating at 517 nm wavelength and 76 MHz repetition rate. The proof of concept was experimentally demonstrated and benchmarking 3D woodpile nanostructures, micro-scaffolds, free-form micro-object “Benchy” and bulk micro-cubes are successfully produced. The essential novelty underlies the fact that non-amplified laser systems delivering just 40-500 p J individual pulses are sufficient for inducing localized cross-linking reactions within hundreds of nanometers in cross sections. And it is opposed to the prejudice that higher pulse energies and lower repetition rates of amplified lasers are necessary for structuring non-photosensitized polymers. The experimental work is of high importance for fundamental understanding of laser enabled nanoscale 3D additive manufacturing and widens technology’ s field of applications where the avoidance of photo-initiator is preferable or is even a necessity, such as micro-optics, nano-photonics, and biomedicine.
基金Project(60574054) supported by the National Natural Science Foundation of China
文摘To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.
基金Project(50435030) supported by the National Natural Science foundation of ChinaProject supported by the Program for New Century Excellent Talents in Chinese University Project(GZ080010) supported by the Open Research Fund Program of Jiangsu Province Key Laboratory for Photon Manufacturing Science and Technology
文摘Twelve samples with periodic array square pillars microstructure were prepared on the silicon wafer by plasma etching techniques, on which space b of the square pillars increased from 5 to 60 μm. In order to study the effect ofb on the wettability of the rough surface, the effects of apparent contact angle （CA） and sliding angle （a） of the droplet on the rough surface were measured with the contact angle meter. The results show that the experimental values of CA well agree with the classical wetting theory and a decreases with the increase of b. Two drop shapes exist on the samples＇ surface, corresponding to the Cassie state and the Wenzel state respectively. The contact state in which a drop would settle depends typically on the size of b. On the role of gravitation, the irreversible transition of a drop from Cassie state to Wenzel state should occur at a certain space of the square pillars. Since the transition has implications on the application of super-hydrophobic rough surfaces, theoretically, the prediction of wetting state transition on square pillar array micro-structured surfaces provides an intuitionistic guidance for the design of steady superhydrophobic surfaces.
基金Project(52175445) supported by the National Natural Science Foundation of ChinaProject(ZZYJKT2020-09) supported by the State Key Laboratory of High Performance Complex Manufacturing (Central South University),China+1 种基金Projects(2020JJ4247, 2022JJ30743) supported by the Natural Foundation of Hunan Province,ChinaProject(1053320190337) supported by the Fundamental Research Funds for the Central University,China。
文摘Electron beam lithography(EBL) is a key technology in the fabrication of nanoscale silicon optical waveguide. The influence of exposure dose, the main process parameter of EBL, on the structure profile of poly-methyl methacrylate(PMMA) after development was studied using a silicon on insulator(SOI) wafer with 220 nm top silicon as the substrate. The relationship between exposure dose and structure pattern width after development was analyzed according to the measurement results. The optimum exposure dose of 220 μC/cm^(2) was found to obtain a final structure consistent with the designed mask value through subsequent processes. At the same time, according to the image segmentation curve tracking technology, the contour extraction process of the dose test results was carried out, and the relationship among mask design value, exposure dose and two-dimensional roughness of boundary contour was analyzed, which can provide reference for the subsequent electron beam lithography of the same substrate material.
