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Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering 被引量:2
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作者 杨兵初 刘晓艳 +1 位作者 高飞 马学龙 《Journal of Central South University of Technology》 EI 2008年第4期449-453,共5页
ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressure... ZnO thin films were prepared by direct current(DC)reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450℃.The effects of the oxygen partial pressures and the treatment of annealing in vacuum on the photoluminescence and the concentration of six intrinsic defects in ZnO thin films such as oxygen vacancy(VO),zinc vacancy(VZn),antisite oxygen(OZn),antisite zinc(ZnO),interstitial oxygen(Oi)and interstitial zinc(Zni)were studied.The results show that a green photoluminescence peak at 520 nm can be observed in all the samples,whose intensity increases with increasing oxygen partial pressure;for the sample annealed in vacuum,the intensity of the green peak increases as well.The green photoluminescence peak observed in ZnO may be attributed to zinc vacancy,which probably originates from transitions between electrons in the conduction band and zinc vacancy levels,or from transitions between electrons in zinc vacancy levels and up valence band. 展开更多
关键词 ZnO thin films PHOTOLUMINESCENCE zinc vacancy magnetron sputtering
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PREPARATION OF TiO_2 THIN FILMS BY MOCVD METHOD 被引量:2
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作者 Tong Jun, Zhang Tong, Zhang Liang-ying, Yao Xi Electronic Materials Research Laboratory, Xi’an Jiaotong University. Xa’an, Shaanxi, 710049, China 《真空科学与技术学报》 EI CAS CSCD 1992年第Z1期215-218,共4页
Preparation of TiO<sub>2</sub> thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO<su... Preparation of TiO<sub>2</sub> thin films by MOCVD method is presented in this paper. A MOCVD system has been designed and built. A wide range of processing conditions are investigated to deposit TiO<sub>2</sub> films on Si wafers starting from metal-organic precursor tetrabutyl titanate. Activation energy of the film formation (E) is obtained to be 23.6 kJ/mol. Structure of films is pure anatase when deposit temperatures are low, rutile forms at 700℃. The films also exhibit preferred crystallographic orientations which strongly depend on deposit conditions. Refractive index increases with increasing of film thickness and decreasing of deposit temperature. 展开更多
关键词 MOCVD RATE PREPARATION OF TiO2 thin films BY MOCVD METHOD TIO
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Low temperature Raman study of PrCoO_3 thin films on LaAlO_3(100) substrates grown by pulsed laser deposition
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作者 PRAKASH R KUMAR S +1 位作者 LEE C G SONG JI 《Journal of Central South University》 SCIE EI CAS 2010年第6期1144-1147,共4页
Thin films of PrCoO3 were deposited on LaAlO3 substrates by pulsed laser deposition technique.X-ray diffraction result indicates that films are single phase and c-axis textured.To investigate the spin state transition... Thin films of PrCoO3 were deposited on LaAlO3 substrates by pulsed laser deposition technique.X-ray diffraction result indicates that films are single phase and c-axis textured.To investigate the spin state transition,Raman spectroscopy measurements were performed at different temperatures.The position of the Raman modes is found to increase while full width at half maximum(FWHM) of these modes is found to decrease with the decrease of temperature across spin state transition temperature(220 K) of PrCoO3. 展开更多
关键词 PrCoO3 thin films Raman spectroscopy pulsed laser deposition
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EFFECT OF SUBSTRATE TEMPERATURE ON Y-Ba-Cu-O THIN FILMS IN SITU GROWTH BY MOCVD
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作者 W. Tao. X. K. Zhang, R. Wang, G. R. Bai Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050, China 《真空科学与技术学报》 EI CAS CSCD 1992年第Z1期179-182,共4页
Superconducting thin films of YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>(Y-Ba-Cu-O) with Tc more than 85K have been deposited in situ by metalorganic chemical vapor deposition ... Superconducting thin films of YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>(Y-Ba-Cu-O) with Tc more than 85K have been deposited in situ by metalorganic chemical vapor deposition (MOCVD) on yttria stabilized zirconia(YSZ) substrates. The relationship of film orientation on substrate temperature and the lowest formation temperature region of superconducting phase have been obtained after changing the substrate temperature. The epitaxial relation between Y-Ba-Cu-O films and the YSZ su bstrates were discussed. 展开更多
关键词 EFFECT OF SUBSTRATE TEMPERATURE ON Y-Ba-Cu-O thin films IN SITU GROWTH BY MOCVD TEM In FIGURE Ba Cu
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Reduced graphene oxide porous films containing SiC whiskers for constructing multilayer electromagnetic shields 被引量:1
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作者 LI Jing Qi Yi-quan +3 位作者 ZHAO Shi-xiang QIU Han-xun YANG Jun-he YANG Guang-zhi 《新型炭材料(中英文)》 SCIE EI CAS CSCD 北大核心 2024年第6期1191-1201,共11页
Developing lightweight and flexible thin films for electromagnetic interference(EMI)shielding is of great importance.Porous thin films of reduced graphene oxide containing SiC whiskers(SiC@RGO)for EMI shielding were p... Developing lightweight and flexible thin films for electromagnetic interference(EMI)shielding is of great importance.Porous thin films of reduced graphene oxide containing SiC whiskers(SiC@RGO)for EMI shielding were prepared by a two-step reduction of graphene oxide(GO),in which the two steps were chemical reduction by HI and the solid phase microwave irradiation.A significant increase of the film thickness from around 20 to 200μm was achieved due to the formation of a porous structure by gases released during the 3 s of solid phase microwave irradiation.The total shielding effectiveness(SET)and the reflective SE(SE_(R))of the SiC@RGO porous thin films depended on the GO/SiC mass ratio.The highest SET achieved was 35.6 dB while the SE_(R) was only 2.8 dB,when the GO/SiC mass ratio was 4∶1.The addition of SiC whiskers was critical for the multi-reflection,interfacial po-larization and dielectric attenuation of EM waves.A multilayer film with a gradient change of SE values was constructed using SiC@RGO porous films and multi-walled carbon nanotubes buckypapers.The highest SET of the multilayer films reached 75.1 dB with a SE_(R) of 2.7 dB for a film thickness of about 1.5 mm.These porous SiC@RGO thin films should find use in multilayer or sand-wich structures for EMI absorption in packaging or lining. 展开更多
关键词 GRAPHENE thin films Silicon carbide whiskers Electromagnetic interference shielding
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Preparation and electrical properties of BaPbO_3 thin film 被引量:1
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作者 陆裕东 王歆 庄志强 《Journal of Central South University of Technology》 EI 2007年第6期759-762,共4页
BaPbO3 thin films were deposited on Al2O3 substrates by sol-gel spin-coating and rapid thermal annealing. The microstructure and phase of BaPbO3 thin films were determined by X-ray diffractometry, scanning electrons m... BaPbO3 thin films were deposited on Al2O3 substrates by sol-gel spin-coating and rapid thermal annealing. The microstructure and phase of BaPbO3 thin films were determined by X-ray diffractometry, scanning electrons microscopy and energy dispersive X-ray spectrometry. The influence of annealing temperature and annealing time on sheet resistance of the thin films was investigated. The results show that heat treatment, including annealing temperature and time, causes notable change in molar ratio of Pb to Ba, resulting in the variations of sheet resistance. The variation of electrical properties demonstrates that the surface state of the film changes from two-dimensional behavior to three-dimensional behavior with the increase of film thickness. Crack-free BaPbO3 thin films with grain size of 90 nm can be obtained by a rapid thermal annealing at 700 ℃ for 10 min. And the BaPbO3 films with a thickness of 2.5 μm has a sheet resistance of 35 Ω·-1. 展开更多
关键词 BAPBO3 thin films SOL-GEL SPIN-COATING electrical resistivity heat treatment
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Fabrication and Application of High Quality Diamond-coated Tools 被引量:5
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作者 SUN Fang-hong 1, ZHANG Zhi-ming 2, CHEN Ming 1, SHEN He-sheng 2 (1. School of Mechanical Engineering, Shanghai Jiaotong University, 2.Institute of Microelectronics Technology, Shanghai Jiaotong University, Shanghai 200030, China) 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2002年第S1期32-33,共2页
Diamond-coated tools were fabricated using Co-cemented carbide inserts as substrates by the electronically aided hot filament chemical vapor deposition (EACVD). An amount of additive in an acid solution was used to pr... Diamond-coated tools were fabricated using Co-cemented carbide inserts as substrates by the electronically aided hot filament chemical vapor deposition (EACVD). An amount of additive in an acid solution was used to promote the Co etching of the substrate surface. The surface of the WC-Co substrate was decarburized by microwave plasma with Ar-H 2 gas. Effect of the new substrate pretreatment on the adhesion of diamond films was investigated. A boron-doped solution was brushed on the tool surface to diffuse boron into the substrates during diamond deposition. A new process was used to lower the surface roughness of diamond thin films by appropriately controlling deposition parameters. It consists of a composite diamond film chemical vapor deposition procedure including first the deposition of the rough polycrystalline diamond and then the fine-grained diamond. The research results show that the pretreatment including both Co etching in acid solution and Ar-H 2 etching decarburization by microwave plasma is an effective method to enhance adhesive strength. An adequate amount of boron dopant solution can effectively suppress the cobalt diffusion to the surface and avoid the catalytic effect of Co at the high temperature. The composite film CVD process can deposit smooth diamond films with low surface roughness. It is of great significance for improvement of the cutting performances of diamond-coated tools using the above new technology to deposit diamond coatings with the low surface roughness and high adhesive strength on WC-Co substrates. 展开更多
关键词 diamond thin films adhesive strength surface roughness
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Freestanding oxide membranes:synthesis,tunable physical properties,and functional devices
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作者 Ao Wang Jinfeng Zhang Lingfei Wang 《中国科学技术大学学报》 CAS CSCD 北大核心 2024年第7期2-17,1,I0002,共18页
The study of oxide heteroepitaxy has been hindered by the issues of misfit strain and substrate clamping,which impede both the optimization of performance and the acquisition of a fundamental understanding of oxide sy... The study of oxide heteroepitaxy has been hindered by the issues of misfit strain and substrate clamping,which impede both the optimization of performance and the acquisition of a fundamental understanding of oxide systems.Recently,however,the development of freestanding oxide membranes has provided a plausible solution to these substrate limitations.Single-crystalline functional oxide films can be released from their substrates without incurring significant damage and can subsequently be transferred to any substrate of choice.This paper discusses recent advancements in the fabrication,adjustable physical properties,and various applications of freestanding oxide perovskite films.First,we present the primary strategies employed for the synthesis and transfer of these freestanding perovskite thin films.Second,we explore the main functionalities observed in freestanding perovskite oxide thin films,with special attention to the tunable functionalities and physical properties of these freestanding perovskite membranes under varying strain states.Next,we encapsulate three representative devices based on freestanding oxide films.Overall,this review highlights the potential of freestanding oxide films for the study of novel functionalities and flexible electronics. 展开更多
关键词 freestanding oxide membranes transition metal oxides thin films electronic devices
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