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Study of Growing Interface and Kinetics Mechanism of Bi_(12)SiO_(20) Crystal
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作者 Chen Jinyuan Shan Guoqiong +1 位作者 Jin Weiqing Yan Hongping 《人工晶体学报》 CSCD 1991年第3期207-207,共1页
As a newly deVeloped method,high temperature in situ observation method can be used to observe directly the interface changes and study the kinetics mechanism during crystal growth.By our newly designed high temperatu... As a newly deVeloped method,high temperature in situ observation method can be used to observe directly the interface changes and study the kinetics mechanism during crystal growth.By our newly designed high temperature in situ observation equiPment,the interface changes of Bi_(12)SiO_(20) crystal growth from melt were studied. 展开更多
关键词 study kinetics mechanism observe directly interface changes bi sio temperature situ observation method crystal growth interface changes high temperature situ observation equipmentthe kinetics mechanism
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