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The Status Quo and Development Trend of High-purity Gold Sputtering Targets 被引量:1
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作者 YANG Anheng XIE Hongchao ZHU Yong 《贵金属》 CAS CSCD 北大核心 2012年第A01期173-176,共4页
This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof. Then, it analyzes the application of high-purity gold sputtering targets in t... This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof. Then, it analyzes the application of high-purity gold sputtering targets in the fields of integrated circuit, information storage, flat panel display, etc. Based on the above, the article analyzes the processing development trend for the high-purity gold sputtering targets in aspects of ultra-high purity, manufacturing technology, analysis and testing technologies. 展开更多
关键词 high-purity gold sputtering targets status quo development trend
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