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Dynamic Ni gettered by PSG from S-MIC poly-Si and its TFTs
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作者 孟志国 李阳 +5 位作者 吴春亚 赵淑芸 李娟 王文 郭海诚 熊绍珍 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第4期1415-1420,共6页
A dynamic phosphor-silicate glass (PSG) gettering method is proposed in which the processes of the gettering of Ni by PSC and the crystallizing of α-Si into poly-Si by Ni take place simultaneously. The effects of P... A dynamic phosphor-silicate glass (PSG) gettering method is proposed in which the processes of the gettering of Ni by PSC and the crystallizing of α-Si into poly-Si by Ni take place simultaneously. The effects of PSC gettering process on the performances of solution-based metal induced crystallized (S-MIC) poly-Si materials and their thin film transistors (TFTs) are discussed. The crystallization rate is much reduced due to the fact that the Ni as a medium source of crystallization is extracted by the PSC during crystallization at the same time. The boundary between two neighbouring grains in S-MIC poly-Si with PSG looks blurrier than without PSG. Compared with the TFTs made from S-MIC poly-Si without PSC gettering, the TFTs made with PSC gettering has a reduced gate induced leakage current. 展开更多
关键词 metal induced crystallization polycrystalline silicon nickel gettering phosphor-silicate glass (PSG)
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Different effect of NiMnCo or FeNiCo on the growth of type-Ⅱa large diamonds with Ti/Cu as nitrogen getter 被引量:4
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作者 李尚升 张贺 +7 位作者 宿太超 胡强 胡美华 龚春生 马红安 贾晓鹏 李勇 肖宏宇 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第6期454-458,共5页
In order to synthesize high-quality type-Ⅱa large diamond, the selection of catalyst is very important, in addition to the nitrogen getter. In this paper, type-IIa large diamonds are grown under high pressure and hig... In order to synthesize high-quality type-Ⅱa large diamond, the selection of catalyst is very important, in addition to the nitrogen getter. In this paper, type-IIa large diamonds are grown under high pressure and high temperature(HPHT) by using the temperature gradient method(TGM), with adopting Ti/Cu as the nitrogen getter in Ni70Mn25Co5(abbreviated as NiMnCo) or Fe(55)Ni(29)Co(16)(abbreviated FeNiCo) catalyst. The values of nitrogen concentration(Nc) in both synthesized high-quality diamonds are less than 1 ppm, when Ti/Cu(1.6 wt%) is added in the FeNiCo or Ti/Cu(1.8 wt%) is added in the NiMnCo. The difference in solubility of nitrogen between both catalysts at HPHT is the basic reason for the different effect of Ti/Cu on eliminating nitrogen. The nitrogen-removal efficiency of Ti/Cu in the NiMnCo catalyst is less than in the FeNiCo catalyst. Additionally, a high-quality type-Ⅱa large diamond size of 5.0 mm is obtained by reducing the growth rate and keeping the nitrogen concentration of the diamond to be less than 1 ppm, when Ti/Cu(1.6 wt%) is added in the FeNiCo catalyst. 展开更多
关键词 high pressure and high temperature catalyst nitrogen getter type-Ⅱa large diamond
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Activation and pumping characteristics of Ti-Zr-V films deposited on narrow tubes 被引量:3
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作者 Bang-Le Zhu Xiao-Qin Ge +4 位作者 Si-Hui Wang Wei Wei Yi-Gang Wang Gong-Fa Liu Yong Wang 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2021年第5期63-70,共8页
Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated... Non-evaporable getter(NEG)films are an integral part of many particle accelerators.These films provide conductance-free evenly distributed pumping,a low thermal outgassing rate,and a low photon-and electron-stimulated desorption.These characteristics make it an ideal solution for resolving the non-uniform pressure distribution in conductance-limited narrow vacuum tubes.In this study,ternary Ti-Zr-V films were deposited on Si substrates and Ag-Cu(Ag 0.085 wt%)tubes with an inner diameter of 22 mm.All Ti-Zr-V films were prepared from an alloy target using the same DC magnetron sputtering parameters.The compositions and corresponding chemical bonding states were analyzed by X-ray photoelectron spectroscopy after activation at different temperatures.The test particle Monte Carlo(TPMC)method was used to measure the sticking probability of the Ti-Zr-V film based on pressure readings during gas injection.The results indicate that activation commences at temperatures as low as 150℃and Ti~0,Zr~0,and V~0 exist on the surface after annealing at 180℃for 1 h.Ti-Zr-V films can be fully activated at 180℃for 24 h.The CO sticking probability reaches 0.15,with a pumping capacity of 1 monolayer. 展开更多
关键词 Non-evaporable getter(NEG) Accelerator vacuum TPMC Activation temperature
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Research on deposition rate of TiZrV/Pd film by DC magnetron sputtering method 被引量:1
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作者 Jie Wang Bo Zhang +1 位作者 Yan-Hui Xu Yong Wang 《Nuclear Science and Techniques》 SCIE CAS CSCD 2017年第4期44-50,共7页
An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced long... An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth. 展开更多
关键词 TiZrV-Pd DEPOSITION rates MAGNETRON SPUTTERING METHOD Non-evaporable GETTER
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