DNA/octadecylamine(ODA) monolayers were transferred onto silicon substrates and the morphologies of the monolayers were investigated by Atomic Force Microscope(AFM). AFM images show that the morphologies of DNA dissol...DNA/octadecylamine(ODA) monolayers were transferred onto silicon substrates and the morphologies of the monolayers were investigated by Atomic Force Microscope(AFM). AFM images show that the morphologies of DNA dissolved in pure water are very different from those of DNA dissolved in the NaCl solution. When DNA molecules are dissovled in pure water, they will form ball-like structure in the monolayer. When the DNA molecules are dissolved in NaCl solution, they will form bunch lines. This DNA line offers a valuable template to direct the formation of unique inorganic nanomaterials.展开更多
Applications of Atomic Force Microscopy (AFM) in optical disc technology are summarized. AFM is ideally suited to the characterization of nanometerscale pit and bump structures in CD/DVD manufacturing, so the relati...Applications of Atomic Force Microscopy (AFM) in optical disc technology are summarized. AFM is ideally suited to the characterization of nanometerscale pit and bump structures in CD/DVD manufacturing, so the relationship between production variables and pits/bumps geometry as well as relations between pits/bumps geometry and electrical performance of discs can be established to perform direct quality control of CD/DVD manufacturing. Applications of AFM in optical disc technology mainly fall into three parts: qualitative analysis of topography of discs/stampers, semiquantitative analysis of pits/bumps geometry of discs/stampers and length analysis of data marks on bump with statistics technology. Qualitative analysis of topography of discs/stampers and semiquantitative analysis of pits/bumps geometry of discs/stampers are chiefly oriented to the measurements of high error rate at beginning of play, pit morphology and block error rate, track pitch variations, pit depth monitoring as well as bump morphology and its surface roughness. It is discovered that the efficiency of the cooling channels of the mold has deteriorated, resulting in the discs being separated from the stamper while they are too soft due to inadequate cooling in the area where high error rate and block error rate are frequently produced. Length analysis of data marks with statistics technology is aimed at the analysis of track pitch and pitch variation, bump length (offset, deviation, asymmetry) and AFM jitter, bump width and width variation, bump height and height variation as well as side wall angle (slope) and slope variation. Statistical analysis of AFM images yields important information about optical disc microstructure and in turn provides information about the performance of the manufacturing process. It is very useful to analyze geometric parameters by considering the fundamental length groups of the data marks. The obtained results demonstrate that AFM have particular advantages in the quality control of discs/stampers manufacturing.展开更多
原子力显微镜(Atomic force microscopy,AFM)是纳米技术和纳米操作领域中最重要的研究工具之一.本文针对扫描成像的原子力显微镜,提出了一种改进的AFM动态成像方法,该方法分析了AFM系统中样品与针尖之间的非线性力对成像精度的影响,通...原子力显微镜(Atomic force microscopy,AFM)是纳米技术和纳米操作领域中最重要的研究工具之一.本文针对扫描成像的原子力显微镜,提出了一种改进的AFM动态成像方法,该方法分析了AFM系统中样品与针尖之间的非线性力对成像精度的影响,通过对扫描过程中获得的成像数据进行融合滤波,有效地提高了快速AFM的成像精度.具体而言,论文首先分析了原子力显微镜当前成像方法存在的主要问题,然后针对在高速扫描或者样品形貌高度有突变时,因AFM系统中非线性因素而引起的成像误差,提出了一种基于临近点集数据融合的改进动态成像方法,以提高AFM对于样品表面形貌的成像精度.最后分别利用原子力显微镜仿真平台数据和实验数据,验证了本文提出的改进成像方法的性能.展开更多
文摘DNA/octadecylamine(ODA) monolayers were transferred onto silicon substrates and the morphologies of the monolayers were investigated by Atomic Force Microscope(AFM). AFM images show that the morphologies of DNA dissolved in pure water are very different from those of DNA dissolved in the NaCl solution. When DNA molecules are dissovled in pure water, they will form ball-like structure in the monolayer. When the DNA molecules are dissolved in NaCl solution, they will form bunch lines. This DNA line offers a valuable template to direct the formation of unique inorganic nanomaterials.
文摘Applications of Atomic Force Microscopy (AFM) in optical disc technology are summarized. AFM is ideally suited to the characterization of nanometerscale pit and bump structures in CD/DVD manufacturing, so the relationship between production variables and pits/bumps geometry as well as relations between pits/bumps geometry and electrical performance of discs can be established to perform direct quality control of CD/DVD manufacturing. Applications of AFM in optical disc technology mainly fall into three parts: qualitative analysis of topography of discs/stampers, semiquantitative analysis of pits/bumps geometry of discs/stampers and length analysis of data marks on bump with statistics technology. Qualitative analysis of topography of discs/stampers and semiquantitative analysis of pits/bumps geometry of discs/stampers are chiefly oriented to the measurements of high error rate at beginning of play, pit morphology and block error rate, track pitch variations, pit depth monitoring as well as bump morphology and its surface roughness. It is discovered that the efficiency of the cooling channels of the mold has deteriorated, resulting in the discs being separated from the stamper while they are too soft due to inadequate cooling in the area where high error rate and block error rate are frequently produced. Length analysis of data marks with statistics technology is aimed at the analysis of track pitch and pitch variation, bump length (offset, deviation, asymmetry) and AFM jitter, bump width and width variation, bump height and height variation as well as side wall angle (slope) and slope variation. Statistical analysis of AFM images yields important information about optical disc microstructure and in turn provides information about the performance of the manufacturing process. It is very useful to analyze geometric parameters by considering the fundamental length groups of the data marks. The obtained results demonstrate that AFM have particular advantages in the quality control of discs/stampers manufacturing.
文摘原子力显微镜(Atomic force microscopy,AFM)是纳米技术和纳米操作领域中最重要的研究工具之一.本文针对扫描成像的原子力显微镜,提出了一种改进的AFM动态成像方法,该方法分析了AFM系统中样品与针尖之间的非线性力对成像精度的影响,通过对扫描过程中获得的成像数据进行融合滤波,有效地提高了快速AFM的成像精度.具体而言,论文首先分析了原子力显微镜当前成像方法存在的主要问题,然后针对在高速扫描或者样品形貌高度有突变时,因AFM系统中非线性因素而引起的成像误差,提出了一种基于临近点集数据融合的改进动态成像方法,以提高AFM对于样品表面形貌的成像精度.最后分别利用原子力显微镜仿真平台数据和实验数据,验证了本文提出的改进成像方法的性能.
