Study on increasing the roughness of the polymer substrate surface to enhance the adhesion with the copper layer in an inductively coupling plasma （ICP） process was carried out. The microstructure of the polymer sub...Study on increasing the roughness of the polymer substrate surface to enhance the adhesion with the copper layer in an inductively coupling plasma （ICP） process was carried out. The microstructure of the polymer substrate surfaces, which were exposed to different kinds of plasma treatment, was identified by scanning electron microscopy（SEM） analysis, peel strength of the copper coating and water surface contact angle. The adhesion of the substrate was largely enhanced by plasma treatment and the copper deposited coating reached a value of 7.68 kgf/m in verifying the adhesion of the copper coating with polymer material. The quality of the line/space 50/50 μm produced in the laboratory was examined by the pressure cooker test and proved to meet the requirement.展开更多
The harmonics and resonance of traction power supply systems(TPSSs)aggravate the electromagnetic interference(EMI)to adjacent metallic pipelines(MPs),which has aroused widespread concern.In this paper,an evaluation me...The harmonics and resonance of traction power supply systems(TPSSs)aggravate the electromagnetic interference(EMI)to adjacent metallic pipelines(MPs),which has aroused widespread concern.In this paper,an evaluation method on pipeline interference voltage under harmonic induction is presented.The results show that the Carson integral formula is more accurate in calculating the mutual impedance at higher frequencies.Then,an integrated train-network-pipeline model is established to estimate the influences of harmonic distortion and resonance on an MP.It is revealed that the higher the harmonic cur-rent distortion rate of the traction load,the larger the interference voltage on an MP.Particularly,the interference voltage is amplified up to 7 times when the TPSS resonates,which is worthy of attention.In addition,the parameters that affect the variation and sensitivity of the interference voltage are studied,namely,the pipeline coating material,locomotive position,and soil resistivity,indicating that soil resistivity and 3PE(3-layer polyethylene)anticorrosive coating are more sensitive to harmonic induction.Field test results show that the harmonic distortion can make the interference voltage more serious,and the protective measures are optimized.展开更多
We take the established inductively coupled plasma(ICP) wind tunnel as a research object to investigate the thermal protection system of re-entry vehicles. A 1.2-MW high power ICP wind tunnel is studied through numeri...We take the established inductively coupled plasma(ICP) wind tunnel as a research object to investigate the thermal protection system of re-entry vehicles. A 1.2-MW high power ICP wind tunnel is studied through numerical simulation and experimental validation. The distribution characteristics and interaction mechanism of the flow field and electromagnetic field of the ICP wind tunnel are investigated using the multi-field coupling method of flow, electromagnetic, chemical, and thermodynamic field. The accuracy of the numerical simulation is validated by comparing the experimental results with the simulation results. Thereafter, the wind tunnel pressure, air velocity, electron density, Joule heating rate, Lorentz force, and electric field intensity obtained using the simulation are analyzed and discussed. The results indicate that for the 1.2-MW ICP wind tunnel, the maximum values of temperature, pressure, electron number density, and other parameters are observed during coil heating. The influence of the radial Lorentz force on the momentum transfer is stronger than that of the axial Lorentz force. The electron number density at the central axis and the amplitude and position of the Joule heating rate are affected by the radial Lorentz force. Moreover, the plasma in the wind tunnel is constantly in the subsonic flow state, and a strong eddy flow is easily generated at the inlet of the wind tunnel.展开更多
Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial m...Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing.This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP.The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density.Furthermore,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model sizes.Additionally,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped distribution.Moreover,the plasma uniformity becomes worse.Finally,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma uniformity.These findings contribute to optimizing the etching process by improving plasma radial uniformity.展开更多
The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for ap...The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.展开更多
Due to a series of challenges such as low-orbit maintenance of satellites, the air-breathing electric propulsion has got widespread attention. Commonly, the radio frequency ion thruster is favored by low-orbit mission...Due to a series of challenges such as low-orbit maintenance of satellites, the air-breathing electric propulsion has got widespread attention. Commonly, the radio frequency ion thruster is favored by low-orbit missions due to its high specific impulse and efficiency. In this paper, the power transfer efficiency of the radio frequency ion thruster with different gas compositions is studied experimentally, which is obtained by measuring the radio frequency power and current of the antenna coil with and without discharge operation. The results show that increasing the turns of antenna coils can effectively improve the radio frequency power transfer efficiency, which is due to the improvement of Q factor. In pure N_2 discharge,with the increase of radio frequency power, the radio frequency power transfer efficiency first rises rapidly and then exhibits a less steep increasing trend. The radio frequency power transfer efficiency increases with the increase of gas pressure at relatively high power, while declines rapidly at relatively low power. In N_(2)/O_(2) discharge, increasing the N_(2) content at high power can improve the radio frequency power transfer efficiency, but the opposite was observed at low power. In order to give a better understanding of these trends, an analytic solution in limit cases is utilized, and a Langmuir probe was employed to measure the electron density. It is found that the evolution of radio frequency power transfer efficiency can be well explained by the variation of plasma resistance, which is related to the electron density and the effective electron collision frequency.展开更多
The electrical parameters of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region are investigated by a Langmuir probe,where Ar fractions range from 0%to 100%.The influence of gas composition ...The electrical parameters of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region are investigated by a Langmuir probe,where Ar fractions range from 0%to 100%.The influence of gas composition and pressure on electron density,the effective electron temperature and the electron energy probability functions(EEPFs)at different spatial positions are present.In driver region,with the introduction of a small amount of Ar at 0.3 Pa,there is a rapid increase in electron density accompanied by a decrease in the effective electron temperature.Additionally,the shape of the EEPF transitions from a three-temperature distribution to a bi-Maxwellian distribution due to an increase in electron-electron collision.However,this phenomenon resulting from the changes in gas composition vanishes at 5 Pa due to the prior depletion of energetic electrons caused by the increase in pressure during hydrogen discharge.The EEPFs for the total energy in expansion region is coincident to these in the driver region at 0.3 Pa,as do the patterns of electron density variation between these two regions for differing Ar fractions.At 5 Pa,as the discharge transitions from H_(2)to Ar,the EEPFs evolved from a bi-Maxwellian distribution with pronounced low energy electrons to a Maxwellian distribution in expansion region.This evolve may be attributed to a reduction in molecular vibrational excitation reactions of electrons during transport and the transition from localized electron dynamics in hydrogen discharge to non-localized electron dynamics in argon discharge.In order to validate the experimental results,we use the COMSOL simulation software to calculate electrical parameters under the same conditions.The evolution and spatial distribution of the electrical parameters of the simulation results agree well with the trend of the experimental results.展开更多
Recently,there has been a huge increase in the usage of fuel resources for automobiles which is severely affecting the climate and causing global warming.The use of electric vehicle(EV)is an effective way to protect t...Recently,there has been a huge increase in the usage of fuel resources for automobiles which is severely affecting the climate and causing global warming.The use of electric vehicle(EV)is an effective way to protect the environment and reduce travel costs.However,the EV charging system has a single charging source,and the charging rate is limited.In this paper,an EV wireless charging system based on dual source power supply has been developed.It realizes intelligent switching between 12 V photovoltaic output and 220 V AC dual source power,and has wireless transmission function.Based on the proposed power supply architecture,the micro wireless charging model is built,which enables the EV model to store power and realize static and mobile control through the wireless induction charging system.展开更多
本文利用微波消解对黄豆进行前处理,采用电感耦合等离子体质谱法(Inductively Coupled Plasma Mass Spectrometer,ICP-MS)对消解液中26种元素的含量进行测定,对方法的线性、精密度、准确度及质控样品进行验证。结果表明,各元素标准曲线...本文利用微波消解对黄豆进行前处理,采用电感耦合等离子体质谱法(Inductively Coupled Plasma Mass Spectrometer,ICP-MS)对消解液中26种元素的含量进行测定,对方法的线性、精密度、准确度及质控样品进行验证。结果表明,各元素标准曲线的相关系数均≥0.9990,线性关系良好,检出限为0.000583~0.453000 mg·kg^(-1),相对标准偏差≤5.513%,加标回收率为77%~113%,说明该方法能准确检测黄豆中无机元素,满足日常监测需求。展开更多
In this paper,the determination of six heavy metal ions (arsenic,lead,cadmium,chromium,mercury and nickel) in the Chinese Herb by inductively coupled plasma-mass spectrometry (ICP-MS) was studied.The samples were dige...In this paper,the determination of six heavy metal ions (arsenic,lead,cadmium,chromium,mercury and nickel) in the Chinese Herb by inductively coupled plasma-mass spectrometry (ICP-MS) was studied.The samples were digested by nitric acid and hydrogen peroxide in a microwave oven.The Sc,Y,In,Bi were added as internal standards to eliminate the matrix interferences.The results show that most of the relative standard deviations of these trace elements were below 3.5%,the standard recoveries of these elements were in the range of 91%-107%,and the detection limits were in the range of 0.001-0.006 μg·L-1. This method is accurate,rapid,convenience,and can be applied to the determination of arsenic,lead,cadmium,chromium,mercury and nickel in Chinese Herb with good results.展开更多
Inductively coupled plasma mass spectrometry(ICP-MS) was used to determine the concentration of Pb in atmospheric particulate samples,and the enrichment factor was calculated.The causes of the results were also discus...Inductively coupled plasma mass spectrometry(ICP-MS) was used to determine the concentration of Pb in atmospheric particulate samples,and the enrichment factor was calculated.The causes of the results were also discussed.展开更多
A study of Cl2/BCl3-based inductively coupled plasma （ICP） was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etc...A study of Cl2/BCl3-based inductively coupled plasma （ICP） was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etching depths of more than 150μm. Plasma etch characteristics with ICP process pressure and the percentage of BCI3 were studied in greater detail at a constant ICP coil/bias power. The measured peak-to-peak voltage as a function of pressure was used to estimate the minimum energy of the ions bombarding the substrate. The process pressure was found to have a substantial influence on the energy of heavy ions. Various ion species in plasma showed minimum energy variation from 1.85 eV to 7.5 eV in the pressure range of 20 mTorr to 50 mTorr. The effect of pressure and the percentage of BCl3 on the etching rate and surface smoothness of the bottom surface of the etched hole were studied for a fixed total flow rate. The etching rate was found to decrease with the percentage of BCl3, whereas the addition of BCl3 resulted in anisotropic holes with a smooth veil free bottom surface at a pressure of 30 mTorr and 42% BC13. In addition, variation of the etching yield with pressure and etching depth were also investigated.展开更多
Mechanical properties and corrosion resistance of Si3N4 films are studied by using different experiment parameters, such as plasma enhanced chemical vapor deposition(PECVD) RF power, ratio of reaction gas, reaction pr...Mechanical properties and corrosion resistance of Si3N4 films are studied by using different experiment parameters, such as plasma enhanced chemical vapor deposition(PECVD) RF power, ratio of reaction gas, reaction pressure and working temperature. The etching process of Si3N4 is studied by inductively coupled plasma (ICP) with a gas mixture of SF6 and O2. The influence of the technique parameters, such as ICP power, DC bias, gas composition, total flow rate, on the etching selectivity of Si3N4/EPG533 which is used as a mask layer and the etching rate of Si3N4 is studied, in order to get a better etching selectivity of Si3N4/EPG533 with a faster etching rate of Si3N4. The optimized process parameters of etching Si3N4 by ICP are obtained after a series of experiments and analysis. Under the conditions of total ICP power of 250 W, DC bias of 50W, total flow rate of 40 sccm and O2 composition of 30%, the etching selectivity of 2.05 can be reached when Si3N4 etching rate is 336 nm/min.展开更多
The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamb...The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z =0 achieves 5.8×1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber.展开更多
ZrN fihns were deposited on Si（111） and M2 steel by inductively coupled plasma （ICP）-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance ...ZrN fihns were deposited on Si（111） and M2 steel by inductively coupled plasma （ICP）-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient （To） of the （111） plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN（111）.展开更多
The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these pa...The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the ＂trial and error＂ method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE＋, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE＋. An optimization performed at the end produces good results.展开更多
An investigation was made into polystyrene （PS） grafted onto nanometre silicon carbide （SIC） particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency （RF） inductively c...An investigation was made into polystyrene （PS） grafted onto nanometre silicon carbide （SIC） particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency （RF） inductively coupled plasma （ICP） treatment of the nanometre powder. FTIR （Fourier transform infrared spectrum） and XPS （X-ray photoelectron spectroscopy） results reveal that PS is grafted onto the surface of silicon carbide powder. An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power, treating time, and grafting reaction temperature and time.展开更多
Two-dimensional（2D） numerical simulations of thermochemical nonequilibrium inductively coupled plasma（ICP） flows inside a 10-kW inductively coupled plasma wind tunnel（ICPWT） were carried out with nitrogen as the...Two-dimensional（2D） numerical simulations of thermochemical nonequilibrium inductively coupled plasma（ICP） flows inside a 10-kW inductively coupled plasma wind tunnel（ICPWT） were carried out with nitrogen as the working gas.Compressible axisymmetric NavierStokes（N-S） equations coupled with magnetic vector potential equations were solved.A fourtemperature model including an improved electron-vibration relaxation time was used to model the internal energy exchange between electron and heavy particles.The third-order accuracy electron transport properties（3rd AETP） were applied to the simulations.A hybrid chemical kinetic model was adopted to model the chemical nonequilibrium process.The flow characteristics such as thermal nonequilibrium,inductive discharge,effects of Lorentz force were made clear through the present study.It was clarified that the thermal nonequilibrium model played an important role in properly predicting the temperature field.The prediction accuracy can be improved by applying the 3rd AETP to the simulation for this ICPWT.展开更多
Inductively coupled plasmas （ICPs） are used in spectrochemical analyses. The introduction of the sample by means of an aerosol are widely used. The introduction and the total evaporation of the aerosol is required i...Inductively coupled plasmas （ICPs） are used in spectrochemical analyses. The introduction of the sample by means of an aerosol are widely used. The introduction and the total evaporation of the aerosol is required in order to obtain a good repeatability and reproducibility of analyses. To check whether the vaporization of the aerosol droplets inside the plasma is completed, a solution could be used to compare the experimental results of the emission spectral lines with theoretical results. An accurate calculation code to obtain monatomic spectral lines intensities is therefore required, which is the purpose of the present paper. The mixtures of argon, water and nitric acid are widely used in spectrochemical analyses with ICPs. With these mixtures, we calculate the composition, thermodynamic functions and monatomic spectral lines intensities of the plasma at thermodynamic equilibrium and at atmospheric pressure. To obtain a self sufficient paper and also to allow other researchers to compare their results, all required data and a robust accurate algorithm, which is simple and easy to compute, are given.展开更多
In this work, incompressible and compressible flows of background gas are characterized in argon inductively coupled plasma by using a fluid model, and the respective influence of the two flows on the plasma propertie...In this work, incompressible and compressible flows of background gas are characterized in argon inductively coupled plasma by using a fluid model, and the respective influence of the two flows on the plasma properties is specified. In the incompressible flow, only the velocity variable is calculated, while in the compressible flow, both the velocity and density variables are calculated. The compressible flow is more realistic; nevertheless, a comparison of the two types of flow is convenient for people to investigate the respective role of velocity and density variables. The peripheral symmetric profile of metastable density near the chamber sidewall is broken in the incompressible flow. At the compressible flow, the electron density increases and the electron temperature decreases. Meanwhile, the metastable density peak shifts to the dielectric window from the discharge center, besides for the peripheral density profile distortion, similar to the incompressible flow.The velocity profile at incompressible flow is not altered when changing the inlet velocity, whereas clear peak shift of velocity profile from the inlet to the outlet at compressible flow is observed as increasing the gas flow rate. The shift of velocity peak is more obvious at low pressures for it is easy to compress the rarefied gas. The velocity profile variations at compressible flow show people the concrete residing processes of background molecule and plasma species in the chamber at different flow rates. Of more significance is it implied that in the usual linear method that people use to calculate the residence time, one important parameter in the gas flow dynamics, needs to be rectified. The spatial profile of pressure simulated exhibits obvious spatial gradient. This is helpful for experimentalists to understand their gas pressure measurements that are always taken at the chamber outlet. At the end, the work specification and limitations are listed.展开更多
文摘Study on increasing the roughness of the polymer substrate surface to enhance the adhesion with the copper layer in an inductively coupling plasma （ICP） process was carried out. The microstructure of the polymer substrate surfaces, which were exposed to different kinds of plasma treatment, was identified by scanning electron microscopy（SEM） analysis, peel strength of the copper coating and water surface contact angle. The adhesion of the substrate was largely enhanced by plasma treatment and the copper deposited coating reached a value of 7.68 kgf/m in verifying the adhesion of the copper coating with polymer material. The quality of the line/space 50/50 μm produced in the laboratory was examined by the pressure cooker test and proved to meet the requirement.
基金This work was supported by the National Natural Science Foundation of China(No.51877182).
文摘The harmonics and resonance of traction power supply systems(TPSSs)aggravate the electromagnetic interference(EMI)to adjacent metallic pipelines(MPs),which has aroused widespread concern.In this paper,an evaluation method on pipeline interference voltage under harmonic induction is presented.The results show that the Carson integral formula is more accurate in calculating the mutual impedance at higher frequencies.Then,an integrated train-network-pipeline model is established to estimate the influences of harmonic distortion and resonance on an MP.It is revealed that the higher the harmonic cur-rent distortion rate of the traction load,the larger the interference voltage on an MP.Particularly,the interference voltage is amplified up to 7 times when the TPSS resonates,which is worthy of attention.In addition,the parameters that affect the variation and sensitivity of the interference voltage are studied,namely,the pipeline coating material,locomotive position,and soil resistivity,indicating that soil resistivity and 3PE(3-layer polyethylene)anticorrosive coating are more sensitive to harmonic induction.Field test results show that the harmonic distortion can make the interference voltage more serious,and the protective measures are optimized.
基金supported by the National Natural Science Foundation of China (Grant No. 11705143)the Open Foundation for Key Laboratories of National Defense Science and Technology of China (Grant No. 6142202031901)the Foundation for Research and Development of Applied Technology in Beilin District of Xi’an,China (Grant No. GX2047)。
文摘We take the established inductively coupled plasma(ICP) wind tunnel as a research object to investigate the thermal protection system of re-entry vehicles. A 1.2-MW high power ICP wind tunnel is studied through numerical simulation and experimental validation. The distribution characteristics and interaction mechanism of the flow field and electromagnetic field of the ICP wind tunnel are investigated using the multi-field coupling method of flow, electromagnetic, chemical, and thermodynamic field. The accuracy of the numerical simulation is validated by comparing the experimental results with the simulation results. Thereafter, the wind tunnel pressure, air velocity, electron density, Joule heating rate, Lorentz force, and electric field intensity obtained using the simulation are analyzed and discussed. The results indicate that for the 1.2-MW ICP wind tunnel, the maximum values of temperature, pressure, electron number density, and other parameters are observed during coil heating. The influence of the radial Lorentz force on the momentum transfer is stronger than that of the axial Lorentz force. The electron number density at the central axis and the amplitude and position of the Joule heating rate are affected by the radial Lorentz force. Moreover, the plasma in the wind tunnel is constantly in the subsonic flow state, and a strong eddy flow is easily generated at the inlet of the wind tunnel.
基金supported by the Scientific Research Foundation of Xijing University,China(No.XJ19T03)the Opening Project of Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory(No.ZHD201701)the Natural Science Basic Research Plan in Shaanxi Province of China(No.2024JC-YBMS-342).
文摘Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing.This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP.The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density.Furthermore,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model sizes.Additionally,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped distribution.Moreover,the plasma uniformity becomes worse.Finally,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma uniformity.These findings contribute to optimizing the etching process by improving plasma radial uniformity.
基金financially supported by National Natural Science Foundation of China(Nos.12075049 and 11935005)。
文摘The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.12005031 and 12275041)the Natural Science Fund from the Interdisciplinary Project of Dalian University(Grant No.DLUXK-2023-QN-001)。
文摘Due to a series of challenges such as low-orbit maintenance of satellites, the air-breathing electric propulsion has got widespread attention. Commonly, the radio frequency ion thruster is favored by low-orbit missions due to its high specific impulse and efficiency. In this paper, the power transfer efficiency of the radio frequency ion thruster with different gas compositions is studied experimentally, which is obtained by measuring the radio frequency power and current of the antenna coil with and without discharge operation. The results show that increasing the turns of antenna coils can effectively improve the radio frequency power transfer efficiency, which is due to the improvement of Q factor. In pure N_2 discharge,with the increase of radio frequency power, the radio frequency power transfer efficiency first rises rapidly and then exhibits a less steep increasing trend. The radio frequency power transfer efficiency increases with the increase of gas pressure at relatively high power, while declines rapidly at relatively low power. In N_(2)/O_(2) discharge, increasing the N_(2) content at high power can improve the radio frequency power transfer efficiency, but the opposite was observed at low power. In order to give a better understanding of these trends, an analytic solution in limit cases is utilized, and a Langmuir probe was employed to measure the electron density. It is found that the evolution of radio frequency power transfer efficiency can be well explained by the variation of plasma resistance, which is related to the electron density and the effective electron collision frequency.
基金supported by the National Natural Science Foundation of China(Grant Nos.11935005 and 12075049)the National Key Research and Development Program of China(Grant No.2017YFE0300106).
文摘The electrical parameters of H_(2)/Ar plasma in a cylindrical inductive discharge with an expansion region are investigated by a Langmuir probe,where Ar fractions range from 0%to 100%.The influence of gas composition and pressure on electron density,the effective electron temperature and the electron energy probability functions(EEPFs)at different spatial positions are present.In driver region,with the introduction of a small amount of Ar at 0.3 Pa,there is a rapid increase in electron density accompanied by a decrease in the effective electron temperature.Additionally,the shape of the EEPF transitions from a three-temperature distribution to a bi-Maxwellian distribution due to an increase in electron-electron collision.However,this phenomenon resulting from the changes in gas composition vanishes at 5 Pa due to the prior depletion of energetic electrons caused by the increase in pressure during hydrogen discharge.The EEPFs for the total energy in expansion region is coincident to these in the driver region at 0.3 Pa,as do the patterns of electron density variation between these two regions for differing Ar fractions.At 5 Pa,as the discharge transitions from H_(2)to Ar,the EEPFs evolved from a bi-Maxwellian distribution with pronounced low energy electrons to a Maxwellian distribution in expansion region.This evolve may be attributed to a reduction in molecular vibrational excitation reactions of electrons during transport and the transition from localized electron dynamics in hydrogen discharge to non-localized electron dynamics in argon discharge.In order to validate the experimental results,we use the COMSOL simulation software to calculate electrical parameters under the same conditions.The evolution and spatial distribution of the electrical parameters of the simulation results agree well with the trend of the experimental results.
基金supported in part by the National Natural Science Foundation of China(No.62371233)in part by the Aviation Science Foundation Project(Nos.2022Z024052003,20230058052001)。
文摘Recently,there has been a huge increase in the usage of fuel resources for automobiles which is severely affecting the climate and causing global warming.The use of electric vehicle(EV)is an effective way to protect the environment and reduce travel costs.However,the EV charging system has a single charging source,and the charging rate is limited.In this paper,an EV wireless charging system based on dual source power supply has been developed.It realizes intelligent switching between 12 V photovoltaic output and 220 V AC dual source power,and has wireless transmission function.Based on the proposed power supply architecture,the micro wireless charging model is built,which enables the EV model to store power and realize static and mobile control through the wireless induction charging system.
文摘In this paper,the determination of six heavy metal ions (arsenic,lead,cadmium,chromium,mercury and nickel) in the Chinese Herb by inductively coupled plasma-mass spectrometry (ICP-MS) was studied.The samples were digested by nitric acid and hydrogen peroxide in a microwave oven.The Sc,Y,In,Bi were added as internal standards to eliminate the matrix interferences.The results show that most of the relative standard deviations of these trace elements were below 3.5%,the standard recoveries of these elements were in the range of 91%-107%,and the detection limits were in the range of 0.001-0.006 μg·L-1. This method is accurate,rapid,convenience,and can be applied to the determination of arsenic,lead,cadmium,chromium,mercury and nickel in Chinese Herb with good results.
文摘Inductively coupled plasma mass spectrometry(ICP-MS) was used to determine the concentration of Pb in atmospheric particulate samples,and the enrichment factor was calculated.The causes of the results were also discussed.
文摘A study of Cl2/BCl3-based inductively coupled plasma （ICP） was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etching depths of more than 150μm. Plasma etch characteristics with ICP process pressure and the percentage of BCI3 were studied in greater detail at a constant ICP coil/bias power. The measured peak-to-peak voltage as a function of pressure was used to estimate the minimum energy of the ions bombarding the substrate. The process pressure was found to have a substantial influence on the energy of heavy ions. Various ion species in plasma showed minimum energy variation from 1.85 eV to 7.5 eV in the pressure range of 20 mTorr to 50 mTorr. The effect of pressure and the percentage of BCl3 on the etching rate and surface smoothness of the bottom surface of the etched hole were studied for a fixed total flow rate. The etching rate was found to decrease with the percentage of BCl3, whereas the addition of BCl3 resulted in anisotropic holes with a smooth veil free bottom surface at a pressure of 30 mTorr and 42% BC13. In addition, variation of the etching yield with pressure and etching depth were also investigated.
文摘Mechanical properties and corrosion resistance of Si3N4 films are studied by using different experiment parameters, such as plasma enhanced chemical vapor deposition(PECVD) RF power, ratio of reaction gas, reaction pressure and working temperature. The etching process of Si3N4 is studied by inductively coupled plasma (ICP) with a gas mixture of SF6 and O2. The influence of the technique parameters, such as ICP power, DC bias, gas composition, total flow rate, on the etching selectivity of Si3N4/EPG533 which is used as a mask layer and the etching rate of Si3N4 is studied, in order to get a better etching selectivity of Si3N4/EPG533 with a faster etching rate of Si3N4. The optimized process parameters of etching Si3N4 by ICP are obtained after a series of experiments and analysis. Under the conditions of total ICP power of 250 W, DC bias of 50W, total flow rate of 40 sccm and O2 composition of 30%, the etching selectivity of 2.05 can be reached when Si3N4 etching rate is 336 nm/min.
基金The project supported by the Natural Science Foundation of Guangdong province (No. 000675) the Key project tackled of Guangdong province (ZKM01401G)
文摘The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z =0 achieves 5.8×1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber.
文摘ZrN fihns were deposited on Si（111） and M2 steel by inductively coupled plasma （ICP）-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient （To） of the （111） plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN（111）.
基金supported by Important National Science & Technology Specific Projects of China (No.2) (Nos.2009ZX02001,2011ZX02403)
文摘The geometry of an inductively coupled plasma （ICP） etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the ＂trial and error＂ method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE＋, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE＋. An optimization performed at the end produces good results.
文摘An investigation was made into polystyrene （PS） grafted onto nanometre silicon carbide （SIC） particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency （RF） inductively coupled plasma （ICP） treatment of the nanometre powder. FTIR （Fourier transform infrared spectrum） and XPS （X-ray photoelectron spectroscopy） results reveal that PS is grafted onto the surface of silicon carbide powder. An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power, treating time, and grafting reaction temperature and time.
基金supported by Grant-in-Aid for Scientific Research(No.23560954)sponsored by the Japan Society for the Promotion of Science
文摘Two-dimensional（2D） numerical simulations of thermochemical nonequilibrium inductively coupled plasma（ICP） flows inside a 10-kW inductively coupled plasma wind tunnel（ICPWT） were carried out with nitrogen as the working gas.Compressible axisymmetric NavierStokes（N-S） equations coupled with magnetic vector potential equations were solved.A fourtemperature model including an improved electron-vibration relaxation time was used to model the internal energy exchange between electron and heavy particles.The third-order accuracy electron transport properties（3rd AETP） were applied to the simulations.A hybrid chemical kinetic model was adopted to model the chemical nonequilibrium process.The flow characteristics such as thermal nonequilibrium,inductive discharge,effects of Lorentz force were made clear through the present study.It was clarified that the thermal nonequilibrium model played an important role in properly predicting the temperature field.The prediction accuracy can be improved by applying the 3rd AETP to the simulation for this ICPWT.
文摘Inductively coupled plasmas （ICPs） are used in spectrochemical analyses. The introduction of the sample by means of an aerosol are widely used. The introduction and the total evaporation of the aerosol is required in order to obtain a good repeatability and reproducibility of analyses. To check whether the vaporization of the aerosol droplets inside the plasma is completed, a solution could be used to compare the experimental results of the emission spectral lines with theoretical results. An accurate calculation code to obtain monatomic spectral lines intensities is therefore required, which is the purpose of the present paper. The mixtures of argon, water and nitric acid are widely used in spectrochemical analyses with ICPs. With these mixtures, we calculate the composition, thermodynamic functions and monatomic spectral lines intensities of the plasma at thermodynamic equilibrium and at atmospheric pressure. To obtain a self sufficient paper and also to allow other researchers to compare their results, all required data and a robust accurate algorithm, which is simple and easy to compute, are given.
基金Project supported by the National Natural Science Foundations of China(Grant No.11305023)
文摘In this work, incompressible and compressible flows of background gas are characterized in argon inductively coupled plasma by using a fluid model, and the respective influence of the two flows on the plasma properties is specified. In the incompressible flow, only the velocity variable is calculated, while in the compressible flow, both the velocity and density variables are calculated. The compressible flow is more realistic; nevertheless, a comparison of the two types of flow is convenient for people to investigate the respective role of velocity and density variables. The peripheral symmetric profile of metastable density near the chamber sidewall is broken in the incompressible flow. At the compressible flow, the electron density increases and the electron temperature decreases. Meanwhile, the metastable density peak shifts to the dielectric window from the discharge center, besides for the peripheral density profile distortion, similar to the incompressible flow.The velocity profile at incompressible flow is not altered when changing the inlet velocity, whereas clear peak shift of velocity profile from the inlet to the outlet at compressible flow is observed as increasing the gas flow rate. The shift of velocity peak is more obvious at low pressures for it is easy to compress the rarefied gas. The velocity profile variations at compressible flow show people the concrete residing processes of background molecule and plasma species in the chamber at different flow rates. Of more significance is it implied that in the usual linear method that people use to calculate the residence time, one important parameter in the gas flow dynamics, needs to be rectified. The spatial profile of pressure simulated exhibits obvious spatial gradient. This is helpful for experimentalists to understand their gas pressure measurements that are always taken at the chamber outlet. At the end, the work specification and limitations are listed.
