Local structure of uncapped and Si capped Ge quantum dots grown on Si(100) has been probed by X ray absorption fine structure spectroscopy. It is found that the uncapped Ge dots are partially oxidized and partially al...Local structure of uncapped and Si capped Ge quantum dots grown on Si(100) has been probed by X ray absorption fine structure spectroscopy. It is found that the uncapped Ge dots are partially oxidized and partially alloyed with Si. The amount of Ge present in the Ge phase is found to be about 20 30%. In the Si capped sample, Ge is found to be dissolved in silicon, the fraction of Ge atoms existing as pure Ge phase being not more than 10%.展开更多
The electric characteristics of Ge quantum dot grown by molecular beam epitaxy in Si matrix were investigated by admittance spectroscopy and deep level transient spectroscopy. The admittance spectroscopy measurements ...The electric characteristics of Ge quantum dot grown by molecular beam epitaxy in Si matrix were investigated by admittance spectroscopy and deep level transient spectroscopy. The admittance spectroscopy measurements show that the activation energy of 0.341eV can be considered as the emitting energy of hole from the ground state of the quantum dot. And the capacitance variation with temperature of the sample shows a platform at various frequencies with reverse bias (0.5 V,) which indicates that the boundary of space charge region is located at the quantum dot layer where the large confined hole concentration blocks the further extension of space charge region. When the temperature increases from 120K to 200K, the holes in the dot emit out completely. The position of the platform shifting with the increase of the applied frequency shows the frequency effects of the charges in the quantum dot. The deep level transient spectroscopy results show that the charge concentration in the Ge quantum dot is a function of the pulse duration and the reverse bias voltage, the activation energy and capture cross-section of hole decrease with the increase of pulse duration due to the Coulomb charging effect. The valence-band offsets of hole in Ge dot obtained by admittance spectroscopy and deep level transient spectroscopy are 0.341 and 0.338eV, respectively.展开更多
利用荧光X射线吸收精细结构(X-ray absorption fine structure,XAFS)方法研究了分子束外延生长的自组装Ge/Si(001)量子点的扩散效应.原子力显微镜结果表明,在550℃的生长温度下形成了面密度为5.2×1011cm-2的高密度小尺寸量子点.XAF...利用荧光X射线吸收精细结构(X-ray absorption fine structure,XAFS)方法研究了分子束外延生长的自组装Ge/Si(001)量子点的扩散效应.原子力显微镜结果表明,在550℃的生长温度下形成了面密度为5.2×1011cm-2的高密度小尺寸量子点.XAFS结果表明,生长的Ge量子点样品覆盖Si层后在550℃温度退火,对Ge/Si之间的热扩散混合的影响较小.随着退火温度升高到800℃,Ge原子的第一近邻配位壳层中的Ge-Si配位的无序度由4.0×10-5nm2降低到2.9×10-5nm2,配位数由3.3升高到3.8,这表明Ge量子点样品中的Ge原子的近邻主要为Si配位原子,高温退火显著增加了Ge原子在Si层中的扩散.展开更多
文摘Local structure of uncapped and Si capped Ge quantum dots grown on Si(100) has been probed by X ray absorption fine structure spectroscopy. It is found that the uncapped Ge dots are partially oxidized and partially alloyed with Si. The amount of Ge present in the Ge phase is found to be about 20 30%. In the Si capped sample, Ge is found to be dissolved in silicon, the fraction of Ge atoms existing as pure Ge phase being not more than 10%.
基金Project(60276025) supported by the National Natural Science Foundation of China
文摘The electric characteristics of Ge quantum dot grown by molecular beam epitaxy in Si matrix were investigated by admittance spectroscopy and deep level transient spectroscopy. The admittance spectroscopy measurements show that the activation energy of 0.341eV can be considered as the emitting energy of hole from the ground state of the quantum dot. And the capacitance variation with temperature of the sample shows a platform at various frequencies with reverse bias (0.5 V,) which indicates that the boundary of space charge region is located at the quantum dot layer where the large confined hole concentration blocks the further extension of space charge region. When the temperature increases from 120K to 200K, the holes in the dot emit out completely. The position of the platform shifting with the increase of the applied frequency shows the frequency effects of the charges in the quantum dot. The deep level transient spectroscopy results show that the charge concentration in the Ge quantum dot is a function of the pulse duration and the reverse bias voltage, the activation energy and capture cross-section of hole decrease with the increase of pulse duration due to the Coulomb charging effect. The valence-band offsets of hole in Ge dot obtained by admittance spectroscopy and deep level transient spectroscopy are 0.341 and 0.338eV, respectively.
文摘利用荧光X射线吸收精细结构(X-ray absorption fine structure,XAFS)方法研究了分子束外延生长的自组装Ge/Si(001)量子点的扩散效应.原子力显微镜结果表明,在550℃的生长温度下形成了面密度为5.2×1011cm-2的高密度小尺寸量子点.XAFS结果表明,生长的Ge量子点样品覆盖Si层后在550℃温度退火,对Ge/Si之间的热扩散混合的影响较小.随着退火温度升高到800℃,Ge原子的第一近邻配位壳层中的Ge-Si配位的无序度由4.0×10-5nm2降低到2.9×10-5nm2,配位数由3.3升高到3.8,这表明Ge量子点样品中的Ge原子的近邻主要为Si配位原子,高温退火显著增加了Ge原子在Si层中的扩散.
