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EFFECT OF SUBSTRATE TEMPERATURE ON Y-Ba-Cu-O THIN FILMS IN SITU GROWTH BY MOCVD
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作者 W. Tao. X. K. Zhang, R. Wang, G. R. Bai Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050, China 《真空科学与技术学报》 EI CAS CSCD 1992年第Z1期179-182,共4页
Superconducting thin films of YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>(Y-Ba-Cu-O) with Tc more than 85K have been deposited in situ by metalorganic chemical vapor deposition ... Superconducting thin films of YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>(Y-Ba-Cu-O) with Tc more than 85K have been deposited in situ by metalorganic chemical vapor deposition (MOCVD) on yttria stabilized zirconia(YSZ) substrates. The relationship of film orientation on substrate temperature and the lowest formation temperature region of superconducting phase have been obtained after changing the substrate temperature. The epitaxial relation between Y-Ba-Cu-O films and the YSZ su bstrates were discussed. 展开更多
关键词 EFFECT OF SUBSTRATE temperature ON Y-Ba-Cu-O THIN FILMS IN SITU growth BY MOCVD TEM In FIGURE Ba Cu
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