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Optical broadband monitoring of thin film growth 被引量:1
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作者 H. Ehlers T. Groβ +1 位作者 m. lappschies D. Ristau 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期403-412,共10页
This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion... This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges. 展开更多
关键词 宽带 光学涂覆技术 薄膜 分光镜
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