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Liquid Encapsulated Melt Zone Processing of GaAs
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作者 ZHOU Bo-jun CHEN Wei-hua +2 位作者 e.jensen A.Amini R.Abbaschian 《Chinese Physics Letters》 SCIE CAS CSCD 1996年第12期950-952,共3页
A liquid encapsulated melt zone process has been developed for single crystal growth of GaAs.Single crystals of 40mm long have been grown with this technique.To avoid unwanted nucleation events and maintain a constant... A liquid encapsulated melt zone process has been developed for single crystal growth of GaAs.Single crystals of 40mm long have been grown with this technique.To avoid unwanted nucleation events and maintain a constant crystal diameter,from top to bottom growth using a short zone with a convex zone surface was found to give the best results.An arsenic overpressure way used to in conjunction with a B_(2)O_(3) encapsulant in order to suppress arsenic dissociation from the melt and maintain the stoichiometry of the crystal. 展开更多
关键词 technique MAINTAIN ARSENIC
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