The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for ap...The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.展开更多
We performed an experimental investigation on the electromagnetic effect and the plasma radial uniformity in a larger-area, cylindrical capacitively coupled plasma reactor. By utilizing a floating hairpin probe, depen...We performed an experimental investigation on the electromagnetic effect and the plasma radial uniformity in a larger-area, cylindrical capacitively coupled plasma reactor. By utilizing a floating hairpin probe, dependences of the plasma radial density on the driving frequency and the radio-frequency power over a wide pressure range of 5-40 Pa were presented. At a relatively low frequency(LF, e.g. 27 MHz), an evident peak generally appears near the electrode edge for all pressures investigated here due to the edge field effect, while at a very high frequency(VHF, e.g.60 or 100 MHz), the plasma density shows a sharp peak at the discharge center at lower pressures, indicating a strong standing wave effect. As the RF power increases, the center-peak structure of plasma density becomes more evident. With increasing the pressure, the standing wave effect is gradually overwhelmed by the ‘stop band’ effect, resulting in a transition in the plasma density profile from a central peak to an edge peak. To improve the plasma radial uniformity, a LF source is introduced into the VHF plasma by balancing the standing wave effect with the edge effect. A much better plasma uniformity can be obtained if one chooses appropriate LF powers, pressures and other corresponding discharge parameters.展开更多
To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature...To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature.This high temperature can modulate the plasma characteristics to a large degree.We thus study the effect of dielectric window temperature on plasma parameters in two different ICP structures based on COMSOL software.The distributions of various plasma species are examined at different dielectric window temperatures.The concentration of neutral gas is found to be largely modulated at high dielectric window temperature,which further affects the electron collision probability with neutrals and the electron temperature.However,the electron density profiles are barely affected by the dielectric window temperature,which is mainly concentrated at the center of the reactor due to the fixed power input and pressure.展开更多
基金financially supported by National Natural Science Foundation of China(Nos.12075049 and 11935005)。
文摘The dual cylindrical inductively coupled plasma source,compared to the conventional structure of inductively coupled plasma source,can significantly improve the uniformity of plasma.It has an enhanced potential for application in processes,such as etching and ashing.A uniform plasma can be obtained by allowing the remote plasma from the upper chamber modulate the main plasma generated in the lower chamber.In this study,a fluid model was employed to investigate a dual cylindrical inductively coupled Ar/O_(2)discharge.The effects of external parameters on electron density,electron temperature,O atomic density,and plasma uniformity in the main chamber were studied,and the reasons were analyzed.The results of this study show that remote power can control the plasma uniformity and increase the plasma density in the main chamber.As the remote power increased,plasma uniformity improved initially and then deteriorated.The main power affected the plasma density at the edge of the main chamber and can modulate the plasma density in the main chamber.The gas pressure affected both the uniformity and density of the plasma.As the gas pressure increased,the plasma uniformity deteriorated,but the free radical density improved.
基金funded by National Natural Science Foundation of China (Nos. 11875100, 11935005 and 11722541)financial support from the China Scholarship Council。
文摘We performed an experimental investigation on the electromagnetic effect and the plasma radial uniformity in a larger-area, cylindrical capacitively coupled plasma reactor. By utilizing a floating hairpin probe, dependences of the plasma radial density on the driving frequency and the radio-frequency power over a wide pressure range of 5-40 Pa were presented. At a relatively low frequency(LF, e.g. 27 MHz), an evident peak generally appears near the electrode edge for all pressures investigated here due to the edge field effect, while at a very high frequency(VHF, e.g.60 or 100 MHz), the plasma density shows a sharp peak at the discharge center at lower pressures, indicating a strong standing wave effect. As the RF power increases, the center-peak structure of plasma density becomes more evident. With increasing the pressure, the standing wave effect is gradually overwhelmed by the ‘stop band’ effect, resulting in a transition in the plasma density profile from a central peak to an edge peak. To improve the plasma radial uniformity, a LF source is introduced into the VHF plasma by balancing the standing wave effect with the edge effect. A much better plasma uniformity can be obtained if one chooses appropriate LF powers, pressures and other corresponding discharge parameters.
基金financially supported by National Natural Science Foundation of China(NSFC)(Nos.12105035 and 11935005)Guangdong Basic and Applied Basic Research Foundation(No.2021B1515120018)+1 种基金the Fundamental Research Funds for the Central Universities(No.DUT21TD104)the Advanced Space Propulsion Laboratory of BICE and Beijing Engineering Research Center of Efficient and Green Aerospace Propulsion Technology(No.Lab ASP-2020-01)。
文摘To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature.This high temperature can modulate the plasma characteristics to a large degree.We thus study the effect of dielectric window temperature on plasma parameters in two different ICP structures based on COMSOL software.The distributions of various plasma species are examined at different dielectric window temperatures.The concentration of neutral gas is found to be largely modulated at high dielectric window temperature,which further affects the electron collision probability with neutrals and the electron temperature.However,the electron density profiles are barely affected by the dielectric window temperature,which is mainly concentrated at the center of the reactor due to the fixed power input and pressure.
