To optimize the existing slurry for abrasive-free polishing(AFP)of hard disk substrate,a water-soluble free radical initiator,2,2-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride(AIBI)is introduced to the H2O2-base...To optimize the existing slurry for abrasive-free polishing(AFP)of hard disk substrate,a water-soluble free radical initiator,2,2-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride(AIBI)is introduced to the H2O2-based slurry.The polishing results show that,the material removal rate(MRR)of hard disk substrate polished with H2O2-based slurry containing AIBI is obviously higher than that without AIBI.The acting mechanism of the improved MRR is investigated.Electron paramagnetic resonances tests show that,by comparison with H2O2 slurry,H2O2-AIBI slurry provides higher concentration of hydroxyl radicals.Auger electron spectrometer analyses further demonstrate that the oxidation ability of H2O2-AIBI slurry is much greater than H2O2 slurry.In addition,potentiodynamic polarization tests show that the corrosion dissolution rate of hard disk substrate in H2O2-AIBI slurry is increased.Therefore that stronger oxidation ability and a higher corrosion dissolution rate of H2O2-AIBI slurry lead to higher MRR can be concluded.展开更多
基金Project supported by the National Natural Science Foundation of China(51175317)the Doctoral Program of Higher Education of China(20123108110016)
文摘To optimize the existing slurry for abrasive-free polishing(AFP)of hard disk substrate,a water-soluble free radical initiator,2,2-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride(AIBI)is introduced to the H2O2-based slurry.The polishing results show that,the material removal rate(MRR)of hard disk substrate polished with H2O2-based slurry containing AIBI is obviously higher than that without AIBI.The acting mechanism of the improved MRR is investigated.Electron paramagnetic resonances tests show that,by comparison with H2O2 slurry,H2O2-AIBI slurry provides higher concentration of hydroxyl radicals.Auger electron spectrometer analyses further demonstrate that the oxidation ability of H2O2-AIBI slurry is much greater than H2O2 slurry.In addition,potentiodynamic polarization tests show that the corrosion dissolution rate of hard disk substrate in H2O2-AIBI slurry is increased.Therefore that stronger oxidation ability and a higher corrosion dissolution rate of H2O2-AIBI slurry lead to higher MRR can be concluded.
