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A new approach for deposition of silver film from AgCl through successive ionic layer adsorption and reaction technique 被引量:1
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作者 Johnson Henry arockiasamy ajaypraveenkumar +1 位作者 Ganesan Sivakumar Kannusamy Mohanraj 《Journal of Central South University》 SCIE EI CAS CSCD 2017年第12期2793-2798,共6页
An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorp... An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction(SILAR) method. The deposited silver thin film was characterized by X-ray diffraction(XRD) analysis, scanning electron microscope(SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS(04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance(SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103 ?·cm at room temperature. 展开更多
关键词 THIN films METALS materials characterization SOL-GEL optical properties SILVER
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