An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorp...An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction(SILAR) method. The deposited silver thin film was characterized by X-ray diffraction(XRD) analysis, scanning electron microscope(SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS(04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance(SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103 ?·cm at room temperature.展开更多
基金the DST-FIST and UGC-SAP,New Delhi for providing the financial support to the Department of Physics,Manonmaniam Sundaranar University
文摘An attempt was made to deposit thin film of silver onto the glass substrate by using Ag Cl precursor, instead of conventional precursor AgNO_3 with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction(SILAR) method. The deposited silver thin film was characterized by X-ray diffraction(XRD) analysis, scanning electron microscope(SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS(04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance(SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103 ?·cm at room temperature.