Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M N...Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M NaOH＋0.066M Na2SiO3＋0.008M （NAPO3）6]. The voltage-time responses show that the PEO process of E2 has the highest discharging voltage, which results in the biggest pores and heaviest cracks on the surfaces. X-ray diffraction results show that coatings produced in E1 and E3 are mainly composed of γ-Al2O3 and mullite, while coatings produced in E2 are mainly composed of a-Al2O3. After PEO treatment the corrosion resistance of aluminium is improved significantly and the coatings produced in E3 perform the best corrosion resistance.展开更多
A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated b...A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated by an electric coil around the tube sample, glow arc plasma moves spirally into the tube from its two ends. A negative voltage applied on the tube realized its inner surface implantation. Titanium nitride （TIN） films are prepared on the inner surface of a stainless steel tube in diameter 90mm and length 600mm. Hardness tests show that the hardness at the tube centre is up to 20 GPa. XRD, XPS and AES analyses demonstrate that good quality of TiN films can be achieved.展开更多
Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morpholo...Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morphology of the films are characterized by x-ray diffraction （XRD）, x-ray photoelectron spectroscopy （XPS）, auger electron spectroscopy, and atomic force microscopy, respectively. The influence of substrate negative bias on crystal structure, composition, surface morphology of the TaN films is systematically studied. At the substrate bias of 0 V and -50 V, the amorphous TaN film is obtained. As the bias increases to -100 V, cubic TaN phase can be found. Stoichiometric TaN with hexagonal lattice preferred （300） orientation is prepared at a bias of -200 V. Combine the XRD and XPS results, the binding energy value of 23.6eV of Ta 4f（7/2） is contributed to hexagonal TaN. Compared to other techniques, TaN thin films fabricated by cathodic vacuum arc at various substrate biases show different microstructures.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 10675165.
文摘Ceramic coatings are fabricated on pure aluminium by plasma electrolytic oxidation （PEO） in three kinds of electrolyte systems [E1： 0.05M NaOH＋0.033M Na2SiO3, E2： 0.025M NaOH＋0.008M （NAPO3）6 and E3： 0.025M NaOH＋0.066M Na2SiO3＋0.008M （NAPO3）6]. The voltage-time responses show that the PEO process of E2 has the highest discharging voltage, which results in the biggest pores and heaviest cracks on the surfaces. X-ray diffraction results show that coatings produced in E1 and E3 are mainly composed of γ-Al2O3 and mullite, while coatings produced in E2 are mainly composed of a-Al2O3. After PEO treatment the corrosion resistance of aluminium is improved significantly and the coatings produced in E3 perform the best corrosion resistance.
基金Supported by the National High Technology Research and Development Programme of China under Grant No 2002AA331020, and the National Natural Science Foundation of China under Grant No 10275088.
文摘A new method named the magnetic glow-arc plasma source ion implantation （MGA-PSⅡ） is proposed for inner surface modification of tubes. In MGA-PSⅡ, under the control of an axial magnetic field, which is generated by an electric coil around the tube sample, glow arc plasma moves spirally into the tube from its two ends. A negative voltage applied on the tube realized its inner surface implantation. Titanium nitride （TIN） films are prepared on the inner surface of a stainless steel tube in diameter 90mm and length 600mm. Hardness tests show that the hardness at the tube centre is up to 20 GPa. XRD, XPS and AES analyses demonstrate that good quality of TiN films can be achieved.
文摘Tantalum nitride （TAN） thin films are achieved on Si（111） and SS317L substrates by cathodic vacuum arc technique, which is rarely reported in the literature. The crystal structure, composition and surface morphology of the films are characterized by x-ray diffraction （XRD）, x-ray photoelectron spectroscopy （XPS）, auger electron spectroscopy, and atomic force microscopy, respectively. The influence of substrate negative bias on crystal structure, composition, surface morphology of the TaN films is systematically studied. At the substrate bias of 0 V and -50 V, the amorphous TaN film is obtained. As the bias increases to -100 V, cubic TaN phase can be found. Stoichiometric TaN with hexagonal lattice preferred （300） orientation is prepared at a bias of -200 V. Combine the XRD and XPS results, the binding energy value of 23.6eV of Ta 4f（7/2） is contributed to hexagonal TaN. Compared to other techniques, TaN thin films fabricated by cathodic vacuum arc at various substrate biases show different microstructures.
