The effect of driving frequency on the structure of silicon grown on Ag（111） film is investigated, which was prepared by using the very-high-frequency（VHF）（40.68 MHz and 60 MHz） magnetron sputtering. The energy ...The effect of driving frequency on the structure of silicon grown on Ag（111） film is investigated, which was prepared by using the very-high-frequency（VHF）（40.68 MHz and 60 MHz） magnetron sputtering. The energy and flux density of the ions impinging on the substrate are also analyzed. It is found that for the 60-MHz VHF magnetron sputtering, the surface of silicon on Ag（111） film exhibits a small cone structure, similar to that of Ag（111） film substrate, indicating a better microstructure continuity. However, for the 40.68-MHz VHF magnetron sputtering, the surface of silicon on Ag（111） film shows a hybrid structure of hollowed-cones and hollowed-particles, which is completely different from that of Ag（111）film. The change of silicon structure is closely related to the differences in the ion energy and flux density controlled by the driving frequency of sputtering.展开更多
The growth of silicon on Ag films via 40.68 MHz very-high-frequency （VHF） magnetron sputtering was investigated. The energy distribution and flux density of the ions on the substrate were also measured. The results ...The growth of silicon on Ag films via 40.68 MHz very-high-frequency （VHF） magnetron sputtering was investigated. The energy distribution and flux density of the ions on the substrate were also measured. The results showed that 40.68 MHz magnetron sputtering can produce ions with higher energy and lower flux density. The impact of these ions onto the grown surface promotes the growth of silicon, which is related to the crystalline nature and microstructure of the underlayer of the Ag films, and there is large particle growth of silicon on Ag films with a preferred orientation of （111）, and two-dimensional growth of silicon on Ag films with a better face-centered cubic structure.展开更多
The initial growth and microstructure feature of Ag films formation were investigated, which were prepared by using the very-high-frequency（VHF）（60 MHz） magnetron sputtering. Because of the moderate energy and ver...The initial growth and microstructure feature of Ag films formation were investigated, which were prepared by using the very-high-frequency（VHF）（60 MHz） magnetron sputtering. Because of the moderate energy and very low flux density of ions impinging on the substrate, the evolutions of initial growth for Ag films formation were well controlled by varying the sputtering power. It was found that the initial growth of Ag films followed the island（Volmer—Weber, VW） growth mode, but before the island nucleation, the adsorption of Ag nanoparticles and the formation of Ag clusters dominated the growth. Therefore, the whole initial stages of Ag films formation included the adsorption of nanoparticles, the formation of clusters, the nucleation by the nanoparticles and clusters simultaneously, the islands formation, and the coalescence of islands.展开更多
Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency（VHF） magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It i...Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency（VHF） magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents.These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents.展开更多
The growth and structural properties of Ag films prepared by radio-frequency（2, 13.56 and27.12 MHz） and very-high-frequency（40.68 and 60 MHz） magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag ...The growth and structural properties of Ag films prepared by radio-frequency（2, 13.56 and27.12 MHz） and very-high-frequency（40.68 and 60 MHz） magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface.Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions＇ energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.11675118 and 11275136)
文摘The effect of driving frequency on the structure of silicon grown on Ag（111） film is investigated, which was prepared by using the very-high-frequency（VHF）（40.68 MHz and 60 MHz） magnetron sputtering. The energy and flux density of the ions impinging on the substrate are also analyzed. It is found that for the 60-MHz VHF magnetron sputtering, the surface of silicon on Ag（111） film exhibits a small cone structure, similar to that of Ag（111） film substrate, indicating a better microstructure continuity. However, for the 40.68-MHz VHF magnetron sputtering, the surface of silicon on Ag（111） film shows a hybrid structure of hollowed-cones and hollowed-particles, which is completely different from that of Ag（111）film. The change of silicon structure is closely related to the differences in the ion energy and flux density controlled by the driving frequency of sputtering.
基金supported by National Natural Science Foundation of China (Nos. 11675118 and 11275136)
文摘The growth of silicon on Ag films via 40.68 MHz very-high-frequency （VHF） magnetron sputtering was investigated. The energy distribution and flux density of the ions on the substrate were also measured. The results showed that 40.68 MHz magnetron sputtering can produce ions with higher energy and lower flux density. The impact of these ions onto the grown surface promotes the growth of silicon, which is related to the crystalline nature and microstructure of the underlayer of the Ag films, and there is large particle growth of silicon on Ag films with a preferred orientation of （111）, and two-dimensional growth of silicon on Ag films with a better face-centered cubic structure.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11675118 and 11275136)
文摘The initial growth and microstructure feature of Ag films formation were investigated, which were prepared by using the very-high-frequency（VHF）（60 MHz） magnetron sputtering. Because of the moderate energy and very low flux density of ions impinging on the substrate, the evolutions of initial growth for Ag films formation were well controlled by varying the sputtering power. It was found that the initial growth of Ag films followed the island（Volmer—Weber, VW） growth mode, but before the island nucleation, the adsorption of Ag nanoparticles and the formation of Ag clusters dominated the growth. Therefore, the whole initial stages of Ag films formation included the adsorption of nanoparticles, the formation of clusters, the nucleation by the nanoparticles and clusters simultaneously, the islands formation, and the coalescence of islands.
基金Project supported by the National Natural Science Foundation of China(Grant No.11275136)
文摘Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency（VHF） magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents.These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents.
基金supported by National Natural Science Foundation of China(Nos.11675118 and 11275136)
文摘The growth and structural properties of Ag films prepared by radio-frequency（2, 13.56 and27.12 MHz） and very-high-frequency（40.68 and 60 MHz） magnetron sputtering were investigated. Using 2 MHz sputtering, the Ag film has a high deposition rate, a uniform and smooth surface and a good fcc structure. Using 13.56 and 27.12 MHz sputtering, the Ag films still have a high deposition rate and a good fcc structure, but a non-uniform and coarse surface.Using 40.68 MHz sputtering, the Ag film has a moderate deposition rate and a good fcc structure, but a less smooth surface. Using 60 MHz sputtering, the Ag film has a uniform and smooth surface, but a low deposition rate and a poor fcc structure. The growth and structural properties of Ag films are related to the ions＇ energy and flux density. Therefore, changing the driving frequency is a good way to control the growth and structure of the Ag films.
