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球形钕铁硼磁粉表面电沉积镍后的性能研究
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作者 蒋梅燕 郑精武 +2 位作者 姜力强 陈巧玲 乔梁 《材料保护》 CAS CSCD 北大核心 2008年第12期25-27,共3页
钕铁硼磁粉表面包覆金属镍层后,可以在300℃左右与聚合物复合制备性能优良的磁体。为了研究金属镍层在钕铁硼磁粉表面的包覆特性,采用电沉积方法在球形钕铁硼磁粉表面包覆一定厚度的镍层,采用扫描电镜(SEM)和热分析仪研究了包覆镍磁粉... 钕铁硼磁粉表面包覆金属镍层后,可以在300℃左右与聚合物复合制备性能优良的磁体。为了研究金属镍层在钕铁硼磁粉表面的包覆特性,采用电沉积方法在球形钕铁硼磁粉表面包覆一定厚度的镍层,采用扫描电镜(SEM)和热分析仪研究了包覆镍磁粉的表面形貌和抗氧化特性,用振动样品磁强计和液压式万能试验机研究了包覆镍后的球形粉和300℃高温处理后粘结磁体的磁性能和抗压强度。结果表明,球形磁粉经包覆镍处理后,磁粉的高温抗氧化性、粘结磁体的抗压强度明显提高。 展开更多
关键词 电沉积镍 钕铁硼球形磁粉 包覆 抗高温氧化性 抗压强度 磁性能
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CO_3^(2-)对羟基乙叉二膦酸镀铜液的影响 被引量:8
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作者 郑精武 蒋梅燕 +3 位作者 乔梁 姜力强 盛嘉伟 张诚 《物理化学学报》 SCIE CAS CSCD 北大核心 2008年第9期1733-1738,共6页
研究羟基乙叉二膦酸(HEDPA)镀铜液中CO23-含量对电沉积时阴、阳极过程及镀层的择优取向的影响.通过分析阴、阳极的动电位极化曲线,发现镀液中逐渐加入的CO23-提高了阴极的极化,使电结晶晶粒细化,直至达到稳定;同时促进了铜阳极的溶解.而... 研究羟基乙叉二膦酸(HEDPA)镀铜液中CO23-含量对电沉积时阴、阳极过程及镀层的择优取向的影响.通过分析阴、阳极的动电位极化曲线,发现镀液中逐渐加入的CO23-提高了阴极的极化,使电结晶晶粒细化,直至达到稳定;同时促进了铜阳极的溶解.而X射线衍射(XRD)结果表明,铜镀层的晶面择优取向从(222)逐渐向(111)转变.通过镀液中固体络合物的红外光谱分析表明,CO23-的加入以第二配体的方式进入该镀液的放电络合离子结构中,参与Cu2+的络合,形成更稳定的络合物,从而导致铜沉积电位负移,镀层(111)晶面取向增强. 展开更多
关键词 羟基乙叉二膦酸 镀铜 晶粒取向
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自蔓延高温合成La-Zn掺杂锶铁氧体改性研究 被引量:4
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作者 乔梁 蒋梅燕 +2 位作者 郑精武 游李顺 姜力强 《材料工程》 EI CAS CSCD 北大核心 2007年第8期20-23,共4页
采用高温自蔓延(SHS)方法制备了化学组成为Sr1-xLaxFe12-xZnxO19(x=0~0.4)的La-Zn联合掺杂的锶铁氧体,并研究了晶体结构与离子掺杂量对铁氧体磁性能的影响。根据相关的热力学数据,分析了合成过程中产生不同氧化物杂质的热力学... 采用高温自蔓延(SHS)方法制备了化学组成为Sr1-xLaxFe12-xZnxO19(x=0~0.4)的La-Zn联合掺杂的锶铁氧体,并研究了晶体结构与离子掺杂量对铁氧体磁性能的影响。根据相关的热力学数据,分析了合成过程中产生不同氧化物杂质的热力学机制,结果显示,通过合适控制反应体系中的Fe粉含量,可以合成单一的M型铁氧体相。SEM表明SHS方法制备的样品比传统方法制备的样品结晶更完整,粉体颗粒呈明显的六角平板状,颗粒尺寸基本分布在0.5~1.2μm之间。La^3+,Zn^2+的加入能够明显地提高试样的综合磁性能,相比于未掺杂的试样,在未取向情况下其剩磁提高了14.4%,Hcb提高了15.3%,(BH)m提高了30.7%,并且与传统制备方法相比,采用SHS方法获得的样品的内禀矫顽力Hcj提高尤为明显,最高可达322kA/m。 展开更多
关键词 自蔓延高温合成法 铁氧体 取代 磁性能
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亚甲基二膦酸为配位体的无氰碱性镀铜 被引量:3
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作者 郑精武 陆国英 +2 位作者 乔梁 姜力强 蒋梅燕 《物理化学学报》 SCIE CAS CSCD 北大核心 2011年第1期143-148,共6页
提出一种以亚甲基二膦酸(MDPA,H4L)为主配位剂的无氰镀铜体系.采用pH电位滴定法分别测定MDPA的四级解离常数和MDPA-Cu(II)的稳定常数,并比较MDPA-Cu(II)和羟基乙叉二膦酸(HEDPA)-Cu(II)的循环伏安曲线和阴极极化曲线.结果表明:MDPA各级... 提出一种以亚甲基二膦酸(MDPA,H4L)为主配位剂的无氰镀铜体系.采用pH电位滴定法分别测定MDPA的四级解离常数和MDPA-Cu(II)的稳定常数,并比较MDPA-Cu(II)和羟基乙叉二膦酸(HEDPA)-Cu(II)的循环伏安曲线和阴极极化曲线.结果表明:MDPA各级解离常数为,pK1=1.86,pK2=2.65,pK3=6.81,pK4=9.04;MDPA与Cu2+形成分级配合物的稳定常数为,pKML=10.65,pKML2=5.59,pKML3=2.50;随着pH升高,形成的配合物依次为,Cu(H3L)2、[Cu(H3L)(H2L)]-和[Cu(H2L)2]2-;当pH在7-10时,MDPA较HEDPA更易与Cu2+配位.当pH=9时,MDPA碱性镀铜体系阴极主要发生的是[Cu(H3L)(H2L)]-和[Cu(H2L)2]2-还原生成铜的过程;在10°C,MDPA体系的铜配位化合物还原生成铜的电位比HEDPA体系负移,扩散速度更快. 展开更多
关键词 无氰镀液 亚甲基二膦酸 铜电沉积 pH电位滴定 羟基乙叉二膦酸
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Micron-sized diamond particles containing Ge-V and Si-V color centers 被引量:2
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作者 Hang-Cheng Zhang Cheng-Ke Chen +3 位作者 Ying-Shuang Mei Xiao Li Mei-Yan Jiang Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第7期354-360,共7页
Micron-sized diamond particles containing germanium-vacancy(Ge-V) color centers with a zero-photon line(ZPL)around 602.3 nm are successfully grown using hot filament chemical vapor deposition.The crystal morphology ch... Micron-sized diamond particles containing germanium-vacancy(Ge-V) color centers with a zero-photon line(ZPL)around 602.3 nm are successfully grown using hot filament chemical vapor deposition.The crystal morphology changes from icosahedron to truncated octahedron and decahedron, finally becomes spherical with the growth pressure increase.Due to the chamber containing Si, all diamond particles contain silicon-vacancy(Si-V) color centers.High growth pressure contributes to the formation of Ge-V and Si-V in diamonds.With prolonging growth time, the change in the full width at half maximum(FWHM) of the diamond peak is small, which shows that the concentration of Ge-V and Si-V centers nearly maintains a constant.The FWHM of the Ge-V ZPL is around 4 nm, which is smaller than that reported, suggesting that the Ge-V center has a more perfect structure.Ge-V and Si-V photoluminescence(PL) intensities increase with the prolonging growth time due to the increased diamond content and reduced content of sp^2-bonded carbon and trans-polyacetylene.In summary, increasing the growth pressure and prolonging the growth time are beneficial to enhance the Ge-V and Si-V PL intensities. 展开更多
关键词 DIAMOND germanium-vacancy silicon-vacancy PHOTOLUMINESCENCE
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Influences of grain size and microstructure on optical properties of microcrystalline diamond films 被引量:1
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作者 Jia-Le Wang Cheng-Ke Chen +2 位作者 Xiao Li Mei-Yan Jiang Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第1期469-474,共6页
Microcrystalline diamond(MCD)films with different grain sizes ranging from 160 nm to 2200 nm are prepared by using a hot filament chemical vapor deposition(HFCVD)system,and the influences of grain size and structural ... Microcrystalline diamond(MCD)films with different grain sizes ranging from 160 nm to 2200 nm are prepared by using a hot filament chemical vapor deposition(HFCVD)system,and the influences of grain size and structural features on optical properties are investigated.The results show that the film with grain size in a range of 160 nm–310 nm exhibits a higher refractive index in a range of(2.77–2.92).With grain size increasing to 620±300 nm,the refractive index shows a value between 2.39 and 2.47,approaching to that of natural diamond(2.37–2.55),and a lower extinction coefficient value between 0.08 and 0.77.When the grain size increases to 2200 nm,the value of refractive index increases to a value between 2.66 and 2.81,and the extinction coefficient increases to a value in a range of 0.22–1.28.Visible Raman spectroscopy measurements show that all samples have distinct diamond peaks located in a range of 1331 cm-1–1333 cm-1,the content of diamond phase increases gradually as grain size increases,and the amount of trans-polyacetylene(TPA)content decreases.Meanwhile,the sp2 carbon clusters content and its full-width-at-half-maximum(FWHM)value are significantly reduced in MCD film with a grain size of 620 nm,which is beneficial to the improvement of the optical properties of the films. 展开更多
关键词 microcrystalline diamond films grain size MICROSTRUCTURE optical properties
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Photoluminescence of SiV centers in CVD diamond particles with specific crystallographic planes
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作者 Ying-Shuang Mei Cheng-Ke Chen +3 位作者 Mei-Yan Jiang Xiao Li Yin-Lan Ruan Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第1期470-477,共8页
We prepared the isolated micrometer-sized diamond particles without seeding on the substrate in hot filament chemical vapor deposition. The diamond particles with specific crystallographic planes and strong silicon-va... We prepared the isolated micrometer-sized diamond particles without seeding on the substrate in hot filament chemical vapor deposition. The diamond particles with specific crystallographic planes and strong silicon-vacancy(SiV) photoluminescence(PL) have been prepared by adjusting the growth pressure. As the growth pressure increases from 2.5 to 3.5 kPa,the diamond particles transit from composite planes of {100} and {111} to only smooth {111} planes. The {111}-faceted diamond particles present better crystal quality and stronger normalized intensity of SiV PL with a narrower bandwidth of 5 nm. Raman depth profiles show that the SiV centers are more likely to be formed on the near-surface areas of the diamond particles, which have poorer crystal quality and greater lattice stress than the inner areas. Complex lattice stress environment in the near-surface areas broadens the bandwidth of SiV PL peak. These results provide a feasible method to prepare diamond particles with specific crystallographic planes and stronger SiV PL. 展开更多
关键词 DIAMOND particle SIV center PHOTOLUMINESCENCE crystallographic PLANES
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Effects of microwave oxygen plasma treatments on microstructure and Ge-V photoluminescent properties of diamond particles
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作者 Ling-Xiao Sheng Cheng-Ke Chen +2 位作者 Mei-Yan Jiang Xiao Li Xiao-Jun Hu 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第8期489-494,共6页
The microstructure and Ge-V photoluminescent properties of diamond particles treated by microwave oxygen plasma are investigated.The results show that in the first 5 min of microwave plasma treatment,graphite and diso... The microstructure and Ge-V photoluminescent properties of diamond particles treated by microwave oxygen plasma are investigated.The results show that in the first 5 min of microwave plasma treatment,graphite and disordered carbon on the surface of the particles are etched away,so that diamond with regular crystal plane,smaller lattice stress,and better crystal quality is exposed,producing a Ge-V photoluminescence(PL)intensity 4 times stronger and PL peak FWHM(full width at half maximum)value of 6.6 nm smaller than the as-deposited sample.It is observed that the cycles of‘diamond is converted into graphite and disordered carbon,then the graphite and disordered carbon are etched’can occur with the treatment time further increasing.During these cycles,the particle surface alternately appears smooth and rough,corresponding to the strengthening and weakening of Ge-V PL intensity,respectively,while the PL intensity is always stronger than that of the as-deposited sample.The results suggest that not only graphite but also disordered carbon weakens the Ge-V PL intensity.Our study provides a feasible way of enhancing the Ge-V PL properties and effectively controlling the surface morphology of diamond particle. 展开更多
关键词 diamond particles Ge-V center microwave oxygen plasma treatment PL enhancement
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