为满足轨道交通领域牵引用3300 V IGBT芯片应具有优良的栅极控制特性、较低的通态压降和较宽的安全工作区的要求,对3300 V IGBT芯片工艺进行了深入研究。在工艺控制和关键工艺改进方面采取措施,全面提升了牵引用3300 V IGBT芯片在栅极...为满足轨道交通领域牵引用3300 V IGBT芯片应具有优良的栅极控制特性、较低的通态压降和较宽的安全工作区的要求,对3300 V IGBT芯片工艺进行了深入研究。在工艺控制和关键工艺改进方面采取措施,全面提升了牵引用3300 V IGBT芯片在栅极特性、电压阻断、导通特性和安全工作区等方面的表现,进而大幅度提高了芯片的可靠性。展开更多
In order to investigate the characteristics and mechanisms of subthreshold voltage hysteresis(ΔV_(th,sub)) of 4 H-SiC metal-oxide-semiconductor field-effect transistors(MOSFETs),4 H-SiC planar and trench MOSFETs and ...In order to investigate the characteristics and mechanisms of subthreshold voltage hysteresis(ΔV_(th,sub)) of 4 H-SiC metal-oxide-semiconductor field-effect transistors(MOSFETs),4 H-SiC planar and trench MOSFETs and corresponding P-type planar and trench metal-oxide-semiconductor(MOS) capacitors are fabricated and characterized.Compared with planar MOSFEF,the trench MOSFET shows hardly larger ΔV_(th,sub) in wide temperature range from 25 0 C to 300 0 C.When operating temperature range is from 25 ℃ to 300 ℃,the off-state negative V_(gs) of planar and trench MOSFETs should be safely above-4 V and-2 V,respectively,to alleviate the effect of ΔV_(th,sub) on the normal operation.With the help of P-type planar and trench MOS capacitors,it is confirmed that the obvious ΔV_(th,sub) of 4 H-SiC MOSFET originates from the high density of the hole interface traps between intrinsic Fermi energy level(E_(i)) and valence band(E_(v)).The maximumΔV_(th,sub) of trench MOSFET is about twelve times larger than that of planar MOSFET,owing to higher density of interface states(D_(it)) between E_(i) and E_(v).These research results will be very helpful for the application of 4 H-SiC MOSFET and the improvement of ΔV_(th,sub) of 4 H-SiC MOSFET,especially in 4 H-SiC trench MOSFET.展开更多
衬底减薄可以大幅提升SiC结势垒肖特基(JBS)二极管的电流密度,但减薄工艺和减薄引入的激光退火工艺仍面临巨大挑战。使用不同型号的金刚砂轮模拟了SiC衬底减薄精磨过程,研究了精磨后SiC衬底的界面质量;同时,使用波长为355 nm的紫外激光...衬底减薄可以大幅提升SiC结势垒肖特基(JBS)二极管的电流密度,但减薄工艺和减薄引入的激光退火工艺仍面临巨大挑战。使用不同型号的金刚砂轮模拟了SiC衬底减薄精磨过程,研究了精磨后SiC衬底的界面质量;同时,使用波长为355 nm的紫外激光器退火Ni/4H-SiC结构,分析了激光能量密度对欧姆接触的性能影响;最后,结合减薄工艺和激光退火工艺制备了厚度为100μm的1 200 V/15 A SiC JBS二极管。结果表明,使用超精细砂轮精磨SiC衬底后,其表面粗糙度为1.26 nm,纵向损伤层厚度约为60 nm;当激光能量密度为1.8 J/cm^(2)时,能形成良好的欧姆接触,比接触电阻率为7.42×10^(-5)Ω·cm^(2);厚度减薄至100μm的1 200 V/15 A SiC JBS二极管在不损失阻断性能的情况下,其正向导通压降比未减薄的减小了0.15 V,电流密度提升了41.27%。展开更多
文摘为满足轨道交通领域牵引用3300 V IGBT芯片应具有优良的栅极控制特性、较低的通态压降和较宽的安全工作区的要求,对3300 V IGBT芯片工艺进行了深入研究。在工艺控制和关键工艺改进方面采取措施,全面提升了牵引用3300 V IGBT芯片在栅极特性、电压阻断、导通特性和安全工作区等方面的表现,进而大幅度提高了芯片的可靠性。
基金Project supported by the National Key Research and Development Program of China(Grant No.2017YFB0903203)the National Natural Science Foundation of China(Grant No.62004033)China Postdoctoral Science Foundation(Grant No.2020M683287)。
文摘In order to investigate the characteristics and mechanisms of subthreshold voltage hysteresis(ΔV_(th,sub)) of 4 H-SiC metal-oxide-semiconductor field-effect transistors(MOSFETs),4 H-SiC planar and trench MOSFETs and corresponding P-type planar and trench metal-oxide-semiconductor(MOS) capacitors are fabricated and characterized.Compared with planar MOSFEF,the trench MOSFET shows hardly larger ΔV_(th,sub) in wide temperature range from 25 0 C to 300 0 C.When operating temperature range is from 25 ℃ to 300 ℃,the off-state negative V_(gs) of planar and trench MOSFETs should be safely above-4 V and-2 V,respectively,to alleviate the effect of ΔV_(th,sub) on the normal operation.With the help of P-type planar and trench MOS capacitors,it is confirmed that the obvious ΔV_(th,sub) of 4 H-SiC MOSFET originates from the high density of the hole interface traps between intrinsic Fermi energy level(E_(i)) and valence band(E_(v)).The maximumΔV_(th,sub) of trench MOSFET is about twelve times larger than that of planar MOSFET,owing to higher density of interface states(D_(it)) between E_(i) and E_(v).These research results will be very helpful for the application of 4 H-SiC MOSFET and the improvement of ΔV_(th,sub) of 4 H-SiC MOSFET,especially in 4 H-SiC trench MOSFET.
文摘衬底减薄可以大幅提升SiC结势垒肖特基(JBS)二极管的电流密度,但减薄工艺和减薄引入的激光退火工艺仍面临巨大挑战。使用不同型号的金刚砂轮模拟了SiC衬底减薄精磨过程,研究了精磨后SiC衬底的界面质量;同时,使用波长为355 nm的紫外激光器退火Ni/4H-SiC结构,分析了激光能量密度对欧姆接触的性能影响;最后,结合减薄工艺和激光退火工艺制备了厚度为100μm的1 200 V/15 A SiC JBS二极管。结果表明,使用超精细砂轮精磨SiC衬底后,其表面粗糙度为1.26 nm,纵向损伤层厚度约为60 nm;当激光能量密度为1.8 J/cm^(2)时,能形成良好的欧姆接触,比接触电阻率为7.42×10^(-5)Ω·cm^(2);厚度减薄至100μm的1 200 V/15 A SiC JBS二极管在不损失阻断性能的情况下,其正向导通压降比未减薄的减小了0.15 V,电流密度提升了41.27%。
