We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported.Negative clusters C-1-C-10 are obtained with beam currents of 1-104 nA at energi...We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported.Negative clusters C-1-C-10 are obtained with beam currents of 1-104 nA at energies of l0-20keV.C-2 beams of 0.2μA are used to directly deposit carbon films on SiO_(2)/Si substrates.Formation of ultrathin carbon films are demonstrated by Raman scattering,which reveals the evolution of the graphitic peak (1550cm-2) with deposition time.展开更多
基金Supported by the International Cooperation Program of the Ministry of Science and Technology of China under Grant No 2010DFA02010the National Natural Science Foundation of China under Grant No 11105100.
文摘We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported.Negative clusters C-1-C-10 are obtained with beam currents of 1-104 nA at energies of l0-20keV.C-2 beams of 0.2μA are used to directly deposit carbon films on SiO_(2)/Si substrates.Formation of ultrathin carbon films are demonstrated by Raman scattering,which reveals the evolution of the graphitic peak (1550cm-2) with deposition time.
