在超振荡望远系统中,球差是影响其分辨本领的重要因素,其原因在于球差导致强度点扩散函数视场内产生高旁瓣,降低该系统的分辨力。本文分析了超振荡望远系统中球差对成像的影响,并确定了该系统对初级球差的容许范围。基于光学超振荡原理...在超振荡望远系统中,球差是影响其分辨本领的重要因素,其原因在于球差导致强度点扩散函数视场内产生高旁瓣,降低该系统的分辨力。本文分析了超振荡望远系统中球差对成像的影响,并确定了该系统对初级球差的容许范围。基于光学超振荡原理,利用线性规划的优化方法,设计超振荡望远系统,在532 nm工作波长下能够实现0.68倍瑞利判据的分辨力。构建针对超振荡望远系统球差的定量分析数学模型,该系统在均方根(root mean square,RMS)不超过0.041倍波长的初级球差干扰下,能分辨三缝目标物,同时分析了窄带工作波长对于该球差系统带来的成像影响。本文在光学测量、环境监视、超分辨望远等领域具有潜在的应用前景。展开更多
The silver（Ag）/photoresist（PR）/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In part...The silver（Ag）/photoresist（PR）/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.展开更多
文摘在超振荡望远系统中,球差是影响其分辨本领的重要因素,其原因在于球差导致强度点扩散函数视场内产生高旁瓣,降低该系统的分辨力。本文分析了超振荡望远系统中球差对成像的影响,并确定了该系统对初级球差的容许范围。基于光学超振荡原理,利用线性规划的优化方法,设计超振荡望远系统,在532 nm工作波长下能够实现0.68倍瑞利判据的分辨力。构建针对超振荡望远系统球差的定量分析数学模型,该系统在均方根(root mean square,RMS)不超过0.041倍波长的初级球差干扰下,能分辨三缝目标物,同时分析了窄带工作波长对于该球差系统带来的成像影响。本文在光学测量、环境监视、超分辨望远等领域具有潜在的应用前景。
基金supported by the National Basic Research Program of China(Grant No.2013CBA01702)the National Natural Science Foundation of China(Grant No.11275045)
文摘The silver（Ag）/photoresist（PR）/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.
