This paper reports that the Zn0.95Co0.05O polycrystalline powder and thin film were prepared by sol-gel technique under the similar preparation conditions. The former does not show typical ferromagnetic behaviour, whi...This paper reports that the Zn0.95Co0.05O polycrystalline powder and thin film were prepared by sol-gel technique under the similar preparation conditions. The former does not show typical ferromagnetic behaviour, while the latter exhibits obvious ferromagnetic properties at 5 K and room temperature. The UV-vis spectra and x-ray absorption spectra show that Co2＋ ions are homogeneously incorporated into ZnO lattice without forming secondary phases.The distinct difference between film and powder sample is the c-axis （002） preferential orientation indicated by the x-ray diffraction pattern and field emission scanning electron microscopy measurement, which may be the reason why Zn0.95Co0.05O film shows ferromagnetic behaviour.展开更多
This paper reports that the （Ga, Co）-codoped ZnO thin films have been grown by inductively coupled plasma enhanced physical vapour deposition. Room-temperature ferromagnetism is observed for the as-grown thin films....This paper reports that the （Ga, Co）-codoped ZnO thin films have been grown by inductively coupled plasma enhanced physical vapour deposition. Room-temperature ferromagnetism is observed for the as-grown thin films. The x-ray absorption fine structure characterization reveals that Co2＋ and Ga3＋ ions substitute for Zn2＋ ions in the ZnO lattice and exclude the possibility of extrinsic ferromagnetism origin. The ferromagnetic （Ga, Co）-codoped ZnO thin films exhibit carrier concentration dependent anomalous Hall effect and positive magnetoresistance at room tempera- ture. The mechanism of anomalous Hall effect and magneto-transport in ferromagnetic ZnO-based diluted magnetic semiconductors is discussed.展开更多
Al-doped ZnO thin film （AZO） is used as a subcontact layer in 6H-SiC photoconductive semiconductor switches （PCSSs） to reduce the on-state resistance and optimize the device structure. Our photoconductive test sho...Al-doped ZnO thin film （AZO） is used as a subcontact layer in 6H-SiC photoconductive semiconductor switches （PCSSs） to reduce the on-state resistance and optimize the device structure. Our photoconductive test shows that the onstate resistance of lateral PCSS with an n＋-AZO subcontact layer is 14.7% lower than that of PCSS without an n＋-AZO subcontact layer. This occurs because a heavy-doped AZO thin film can improve Ohmic contact properties, reduce contact resistance, and alleviate Joule heating. Combined with the high transparance characteristic at 532 nm of AZO film, vertical structural PCSS devices are designed and their structural superiority is discussed. This paper provides a feasible route for fabricating high performance SiC PCSS by using conductive and transparent ZnO-based materials.展开更多
This study focuses on the effect of V-doping on the ferromagnetism（FM） of 6H-SiC powder.The X-ray diffraction results indicate that V is inserted into the 6H-SiC lattice.The Raman spectra reveal that with a V concen...This study focuses on the effect of V-doping on the ferromagnetism（FM） of 6H-SiC powder.The X-ray diffraction results indicate that V is inserted into the 6H-SiC lattice.The Raman spectra reveal that with a V concentration of 25 ppm,the crystalline quality and carrier concentration of 6H-SiC are hardly varied.It is found that after the V-doping process,the saturation magnetization（Ms） and the vacancy concentration of 6H-SiC are both increased.From these results,it is deduced that the effect of V might contribute mainly to the increase of vacancy concentration,thus resulting in the increase of Ms of V-doped 6H-SiC.展开更多
A series of Mn-doped ZnO films have been prepared in different sputtering plasmas by using the inductively coupled plasma enhanced physical vapour deposition. The films show paramagnetic behaviour when they are deposi...A series of Mn-doped ZnO films have been prepared in different sputtering plasmas by using the inductively coupled plasma enhanced physical vapour deposition. The films show paramagnetic behaviour when they are deposited in an argon plasma. The Hall measurement indicates that ferromagnetism cannot be realized by increasing the electron concentration. However, the room-temperature ferromagnetism is obtained when the films are deposited in a mixed argon-nitrogen plasma. The first-principles calculations reveal that antiferromagnetic ordering is favoured in the case of the substitution of Mn^2＋ for Zn^2＋ without additional acceptor doping. The substitution of N for O （NO^-） is necessary to induce ferromagnetic couplings in the Zn-Mn-O system. The hybridization between N 2p and Mn 3d provides an empty orbit around the Fermi level. The hopping of Mn 3d electrons through the empty orbit can induce the ferromagnetic coupling. The ferromagnetism in the N-doped Zn-Mn-O system possibly originates from the charge transfer between Mn^2＋ and Mn^3＋ via NO^-, The key factor is the empty orbit provided by substituting N for O, rather than the conductivity type or the carrier concentration.展开更多
Undoped and V-doped 6H-SiC single crystals have been grown by the physical vapor transport method.The V concentration is determined to be 3.76×10^17 at/cm^3 and 6.14×10^17 at/cm^3 by secondary ion mass spect...Undoped and V-doped 6H-SiC single crystals have been grown by the physical vapor transport method.The V concentration is determined to be 3.76×10^17 at/cm^3 and 6.14×10^17 at/cm^3 by secondary ion mass spectrometry for low V-doped and high V-doped SiC samples,respectively.The undoped 6H-SiC shows diamagnetism,while the V-doped 6H-SiC exhibits weak ferromagnetism.The lower V-doped sample shows stronger ferromagnetism compared to that of the higher V-doped sample.However,the structural characterization indicates that the lower V-doped SiC has a relative poor crystalline quality.It is found that both V dopants and defects are essential for introducing ferromagnetic exchange in V-doped SiC single crystals.展开更多
The effect of surface morphology of 6H-SiC substrate on the ohmic contact properties of Ti/6H-SiC structure is studied. The H-terminated surface on Si-face 6H-SiC is obtained by both dipping SiC into HF acid solution ...The effect of surface morphology of 6H-SiC substrate on the ohmic contact properties of Ti/6H-SiC structure is studied. The H-terminated surface on Si-face 6H-SiC is obtained by both dipping SiC into HF acid solution for 15 s and thermal heating SiC in hydrogen atmosphere at 1100 ℃ for 10 min, while the H-terminated surface on C-face 6H-SiC could be obtained only by the latter method. Ti is deposited on Si-face and C-face SiC substrates with H-terminated surfaces and ohmic contact is obtained without high-temperature annealing.展开更多
A Ni/Ta bilayer is deposited on n-type 6H–SiC and then annealed at different temperatures to form an ohmic contact. The electrical properties are characterized by I–V curve measurement and the specific contact resis...A Ni/Ta bilayer is deposited on n-type 6H–SiC and then annealed at different temperatures to form an ohmic contact. The electrical properties are characterized by I–V curve measurement and the specific contact resistance is extracted by the transmission line method. The phase formation and microstructure of the Ni/Ta bilayer are studied after thermal annealing. The crystalline and microstructure properties are analyzed by using glance incident x-ray diffraction（GIXRD）,Raman spectroscopy, and transmission electron microscopy. It is found that the transformation from the Schottky to the Ohmic occurs at 1050℃ and the GIXRD results show a distinct phase change from Ta2C to TaC at this temperature. A specific contact resistance of 6.5×10^-5Ω·cm^2is obtained for sample Ni（80 nm）/Ta（20 nm）/6H–SiC after being annealed at 1050℃. The formation of the TaC phase is regarded as the main reason for the excellent Ohmic properties of the Ni/Ta contacts to 6H–Si C. Raman and TEM data reveal that the graphite carbon is drastically consumed by the Ta element, which can improve the contact thermal stability. A schematic diagram is proposed to illustrate the microstructural changes of Ni/Ta/6H–SiC when annealed at different temperatures.展开更多
The 3C-SiC thin films used herein are grown on Si substrates by chemical vapor deposition. A1 contacts with differ- ent thickness values are deposited on the 3C-SiC/Si （100） structure by the magnetron sputtering met...The 3C-SiC thin films used herein are grown on Si substrates by chemical vapor deposition. A1 contacts with differ- ent thickness values are deposited on the 3C-SiC/Si （100） structure by the magnetron sputtering method and are annealed at different temperatures. We focus on the effects of the annealing temperature on the ohmic contact properties and mi- crostructure of A1/3C-SiC structure. The electrical properties of A1 contacts to n-type 3C-SiC are characterized by the transmission line method. The crystal structures and chemical phases of A1 contacts are examined by X-ray diffraction, Raman spectra, and transmission electron microscopy, respectively. It is found that the A1 contacts exhibit ohmic contact behaviors when the annealing temperature is below 550 ℃, and they become Schottky contacts when the annealing tem- perature is above 650 ℃. A minimum specific contact resistance of 1.8 × 10-4 Ω cm2 is obtained when the A1 contact is annealed at 250 ℃.展开更多
A high-quality Ga2O3 thin film is deposited on an SiC substrate to form a heterojunction structure. The band alignment of the Ga2O3/6H-SiC heterojunction is studied by using synchrotron radiation photoelectron spectro...A high-quality Ga2O3 thin film is deposited on an SiC substrate to form a heterojunction structure. The band alignment of the Ga2O3/6H-SiC heterojunction is studied by using synchrotron radiation photoelectron spectroscopy, The energy band diagram of the Ga2O3/6H-SiC heterojunction is obtained by analysing the binding energies of Ga 3d and Si 2p at the surface and the interface of the heterojunction. The valence band offset is experimentally determined to be 2.8 eV and the conduction band offset is calculated to be 0.89 eV, which indicate a type-II band alignment. This provides useful guidance for the application of Ga2O3/6H-SiC electronic devices.展开更多
文摘This paper reports that the Zn0.95Co0.05O polycrystalline powder and thin film were prepared by sol-gel technique under the similar preparation conditions. The former does not show typical ferromagnetic behaviour, while the latter exhibits obvious ferromagnetic properties at 5 K and room temperature. The UV-vis spectra and x-ray absorption spectra show that Co2＋ ions are homogeneously incorporated into ZnO lattice without forming secondary phases.The distinct difference between film and powder sample is the c-axis （002） preferential orientation indicated by the x-ray diffraction pattern and field emission scanning electron microscopy measurement, which may be the reason why Zn0.95Co0.05O film shows ferromagnetic behaviour.
基金supported by the National Natural Science Foundation of China (Grant No. 50772122)the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51002176)
文摘This paper reports that the （Ga, Co）-codoped ZnO thin films have been grown by inductively coupled plasma enhanced physical vapour deposition. Room-temperature ferromagnetism is observed for the as-grown thin films. The x-ray absorption fine structure characterization reveals that Co2＋ and Ga3＋ ions substitute for Zn2＋ ions in the ZnO lattice and exclude the possibility of extrinsic ferromagnetism origin. The ferromagnetic （Ga, Co）-codoped ZnO thin films exhibit carrier concentration dependent anomalous Hall effect and positive magnetoresistance at room tempera- ture. The mechanism of anomalous Hall effect and magneto-transport in ferromagnetic ZnO-based diluted magnetic semiconductors is discussed.
基金Project supported by the Innovation Program of the Shanghai Institute of Ceramics(Grant No.Y39ZC1110G)the Innovation Program of the Chinese Academy of Sciences(Grant No.KJCX2-EW-W10)+3 种基金the Industry–Academic Joint Technological Innovations Fund Project of Jiangsu Province,China(Grant No.BY2011119)the Natural Science Foundation of Shanghai(Grant No.14ZR1419000)the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.61404146)the National High-tech R&D Program of China(Grant Nos.2013AA031603 and 2014AA032602)
文摘Al-doped ZnO thin film （AZO） is used as a subcontact layer in 6H-SiC photoconductive semiconductor switches （PCSSs） to reduce the on-state resistance and optimize the device structure. Our photoconductive test shows that the onstate resistance of lateral PCSS with an n＋-AZO subcontact layer is 14.7% lower than that of PCSS without an n＋-AZO subcontact layer. This occurs because a heavy-doped AZO thin film can improve Ohmic contact properties, reduce contact resistance, and alleviate Joule heating. Combined with the high transparance characteristic at 532 nm of AZO film, vertical structural PCSS devices are designed and their structural superiority is discussed. This paper provides a feasible route for fabricating high performance SiC PCSS by using conductive and transparent ZnO-based materials.
基金Project supported by the Innovation Programs of the Chinese Academy of Sciences (Grant No. KJCX2-EW-W10)
文摘This study focuses on the effect of V-doping on the ferromagnetism（FM） of 6H-SiC powder.The X-ray diffraction results indicate that V is inserted into the 6H-SiC lattice.The Raman spectra reveal that with a V concentration of 25 ppm,the crystalline quality and carrier concentration of 6H-SiC are hardly varied.It is found that after the V-doping process,the saturation magnetization（Ms） and the vacancy concentration of 6H-SiC are both increased.From these results,it is deduced that the effect of V might contribute mainly to the increase of vacancy concentration,thus resulting in the increase of Ms of V-doped 6H-SiC.
基金Project supported by the Shanghai Nanotechnology Promotion Center (Grant No 0452nm071)the National Natural Science Foundation of China (Grant Nos 50702071 and 50772122)
文摘A series of Mn-doped ZnO films have been prepared in different sputtering plasmas by using the inductively coupled plasma enhanced physical vapour deposition. The films show paramagnetic behaviour when they are deposited in an argon plasma. The Hall measurement indicates that ferromagnetism cannot be realized by increasing the electron concentration. However, the room-temperature ferromagnetism is obtained when the films are deposited in a mixed argon-nitrogen plasma. The first-principles calculations reveal that antiferromagnetic ordering is favoured in the case of the substitution of Mn^2＋ for Zn^2＋ without additional acceptor doping. The substitution of N for O （NO^-） is necessary to induce ferromagnetic couplings in the Zn-Mn-O system. The hybridization between N 2p and Mn 3d provides an empty orbit around the Fermi level. The hopping of Mn 3d electrons through the empty orbit can induce the ferromagnetic coupling. The ferromagnetism in the N-doped Zn-Mn-O system possibly originates from the charge transfer between Mn^2＋ and Mn^3＋ via NO^-, The key factor is the empty orbit provided by substituting N for O, rather than the conductivity type or the carrier concentration.
基金Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51002176)the Innovation Programs of the Chinese Academy of Sciences (Grant No. KJCX2-EW-W10)
文摘Undoped and V-doped 6H-SiC single crystals have been grown by the physical vapor transport method.The V concentration is determined to be 3.76×10^17 at/cm^3 and 6.14×10^17 at/cm^3 by secondary ion mass spectrometry for low V-doped and high V-doped SiC samples,respectively.The undoped 6H-SiC shows diamagnetism,while the V-doped 6H-SiC exhibits weak ferromagnetism.The lower V-doped sample shows stronger ferromagnetism compared to that of the higher V-doped sample.However,the structural characterization indicates that the lower V-doped SiC has a relative poor crystalline quality.It is found that both V dopants and defects are essential for introducing ferromagnetic exchange in V-doped SiC single crystals.
基金Project supported by the Innovation Program of the Chinese Academy of Sciences (Grant No. KJCX2-EW-W10)the Shanghai Municipal Science and Technology Commission, China (Grant Nos. 09DZ1141400 and 09520714900)the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51002176)
文摘The effect of surface morphology of 6H-SiC substrate on the ohmic contact properties of Ti/6H-SiC structure is studied. The H-terminated surface on Si-face 6H-SiC is obtained by both dipping SiC into HF acid solution for 15 s and thermal heating SiC in hydrogen atmosphere at 1100 ℃ for 10 min, while the H-terminated surface on C-face 6H-SiC could be obtained only by the latter method. Ti is deposited on Si-face and C-face SiC substrates with H-terminated surfaces and ohmic contact is obtained without high-temperature annealing.
基金Project supported by the Innovation Program of the Chinese Academy of Sciences(Grant No.KJCX2-EW-W10)the Shanghai Rising-star Program+3 种基金China(Grant No.13QA1403800)the Industry–Academic Joint Technological Innovations Fund Project of Jiangsu ProvinceChina(Grant No.BY2011119)the National High-tech Research and Development Program of China(Grant Nos.2013AA031603 and 2014AA032602)
文摘A Ni/Ta bilayer is deposited on n-type 6H–SiC and then annealed at different temperatures to form an ohmic contact. The electrical properties are characterized by I–V curve measurement and the specific contact resistance is extracted by the transmission line method. The phase formation and microstructure of the Ni/Ta bilayer are studied after thermal annealing. The crystalline and microstructure properties are analyzed by using glance incident x-ray diffraction（GIXRD）,Raman spectroscopy, and transmission electron microscopy. It is found that the transformation from the Schottky to the Ohmic occurs at 1050℃ and the GIXRD results show a distinct phase change from Ta2C to TaC at this temperature. A specific contact resistance of 6.5×10^-5Ω·cm^2is obtained for sample Ni（80 nm）/Ta（20 nm）/6H–SiC after being annealed at 1050℃. The formation of the TaC phase is regarded as the main reason for the excellent Ohmic properties of the Ni/Ta contacts to 6H–Si C. Raman and TEM data reveal that the graphite carbon is drastically consumed by the Ta element, which can improve the contact thermal stability. A schematic diagram is proposed to illustrate the microstructural changes of Ni/Ta/6H–SiC when annealed at different temperatures.
基金supported by the Shanghai Rising-Star Program,China(Grant No.13QA1403800)the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.51002176)+2 种基金the Innovation Program of the Chinese Academy of Sciences(Grant No.KJCX2-EW-W10)the Industry–Academic Joint Technological Innovations Fund Project of Jiangsu Province,China(Grant No.BY2011119)the National High Technology Research and Development Program of China(Grant Nos.2013AA031603 and 2014AA032602)
文摘The 3C-SiC thin films used herein are grown on Si substrates by chemical vapor deposition. A1 contacts with differ- ent thickness values are deposited on the 3C-SiC/Si （100） structure by the magnetron sputtering method and are annealed at different temperatures. We focus on the effects of the annealing temperature on the ohmic contact properties and mi- crostructure of A1/3C-SiC structure. The electrical properties of A1 contacts to n-type 3C-SiC are characterized by the transmission line method. The crystal structures and chemical phases of A1 contacts are examined by X-ray diffraction, Raman spectra, and transmission electron microscopy, respectively. It is found that the A1 contacts exhibit ohmic contact behaviors when the annealing temperature is below 550 ℃, and they become Schottky contacts when the annealing tem- perature is above 650 ℃. A minimum specific contact resistance of 1.8 × 10-4 Ω cm2 is obtained when the A1 contact is annealed at 250 ℃.
基金supported by the National Natural Science Foundation of China(Grant Nos.50702071 and 50772122)the Young Scientists Fund of the National Natural Science Foundation of China(Grant No.51002176)
文摘A high-quality Ga2O3 thin film is deposited on an SiC substrate to form a heterojunction structure. The band alignment of the Ga2O3/6H-SiC heterojunction is studied by using synchrotron radiation photoelectron spectroscopy, The energy band diagram of the Ga2O3/6H-SiC heterojunction is obtained by analysing the binding energies of Ga 3d and Si 2p at the surface and the interface of the heterojunction. The valence band offset is experimentally determined to be 2.8 eV and the conduction band offset is calculated to be 0.89 eV, which indicate a type-II band alignment. This provides useful guidance for the application of Ga2O3/6H-SiC electronic devices.
