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In situ electronic structural study of VO_2 thin film across the metal–insulator transition
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作者 伊明江.买买提 阿布都艾则孜.阿布来提 +3 位作者 吴蕊 王嘉鸥 钱海杰 奎热西.依布拉欣 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第12期410-415,共6页
The in situ valence band photoemission spectrum (PES) and X-ray absorption spectrum (XAS) at V LⅡ-LⅢ edges of the VO2 thin film, which is prepared by pulsed laser deposition, are measured across the metal–insul... The in situ valence band photoemission spectrum (PES) and X-ray absorption spectrum (XAS) at V LⅡ-LⅢ edges of the VO2 thin film, which is prepared by pulsed laser deposition, are measured across the metal–insulator transition (MIT) temperature (TMIT=67 ℃). The spectra show evidence for changes in the electronic structure depending on temperature. Across the TMIT, pure V 3d characteristic d‖ and O 2p-V 3d hybridization characteristic πpd, σpd bands vary in binding energy position and density of state distributions. The XAS reveals a temperature-dependent reversible energy shift at the V LⅢ-edge. The PES and XAS results imply a synergetic energy position shift of occupied valence bands and unoccupied conduction band states across the phase transition. A joint inspection of the PES and XAS results shows that the MIT is not a one-step process, instead it is a process in which a semiconductor phase appears as an intermediate state. The final metallic phase from insulating state is reached through insulator–semiconductor, semiconductor–metal processes, and vice versa. The conventional MIT at around the TMIT=67 ℃ is actually a semiconductor–insulator transformation point. 展开更多
关键词 vanadium dioxide metal–insulator transition electronic structure photoemission spectroscopy
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