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基于SiGe BiCMOS工艺的片上太赫兹滤波器

Terahertz filter based on SiGe BiCMOS process
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摘要 基于硅锗双极-互补金属氧化物半导体(SiGe BiCMOS)工艺,采用衬底集成波导(SIW)结构,设计了几款片上太赫兹滤波器。测试结果中带宽和中心频率分别为20GHz@139GHz,20GHz@168GHz和26GHz@324GHz,结果表明制作的带通滤波器中心频率与设计的偏差很小;滤波器在中心频率的插入损耗为-6dB@139GHz,-5.5dB@168GHz和-5dB@324GHz。 Based on Silicon Germanium Bipolar Complementary Metal Oxide Semiconductor(SiGe BiCMOS) process technology, several terahertz filters with Substrate Integrated Waveguide(SIW) structures are designed. The measured results show that the deviation of the center frequency is very small compared with the design. The center frequencies and bandwidths of the filters are 20GHz@139GHz, 20GHz@168GHz and 26GHz@324GHz, respectively. The insertion losses of the filters on the center frequency are -6dB@140GHz, -5.5dB@170GHz and -5dB@330GHz, respectively.
出处 《太赫兹科学与电子信息学报》 2015年第6期849-852,共4页 Journal of Terahertz Science and Electronic Information Technology
关键词 滤波器 太赫兹 硅锗双极-互补金属氧化物半导体 衬底集成波导 filter terahertz SiGe BiCMOS Substrate Integrated Waveguide
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参考文献9

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