摘要
This paper presents the formation of Cr-O thin films on an iron substrate by multi-arc ion plating, which are intended to be used as a thermal radiation absorbent in electronic vacuum devices. Only oxygen was used as a reaction gas during deposition, the Cr-O thin film, must have high adhesion and low outgassing rate. The scratch test shows that the critical load, for an applicable Cr-O thin film deposited in oxygen atmosphere alone at a pressure of 8×10<sup>-1</sup> Pa, was as high as 6kg.
This paper presents the formation of Cr-O thin films on an iron substrate by multi-arc ion plating, which are intended to be used as a thermal radiation absorbent in electronic vacuum devices. Only oxygen was used as a reaction gas during deposition, the Cr-O thin film, must have high adhesion and low outgassing rate. The scratch test shows that the critical load, for an applicable Cr-O thin film deposited in oxygen atmosphere alone at a pressure of 8×10<sup>-1</sup> Pa, was as high as 6kg.
出处
《真空科学与技术学报》
EI
CAS
CSCD
1992年第Z1期107-110,共4页
Chinese Journal of Vacuum Science and Technology
