摘要
研究了在低温磁控溅射沉积TiN薄膜过程中,负偏压对基体温度、薄膜表面性能、薄膜与基体界面结合强度以及摩擦学性能的影响。研究结果表明,加负偏压条件下,明显提高基体温度,有益于晶粒细化,提高硬度,改善色泽,提高TiN/基体的界面结合强度,但会引起表面轻微的粗糙化;摩擦学试验表明,负偏压对低温磁控溅射TiN薄膜及其摩擦副的摩擦磨损性能的影响较明显。
A series of experiments were conducted to study the effects of negative bias voltage on substrate temperature, surface properties of the film, adhesive strength with the substrate, and tribological properties of the film during the preparation of TiN film using low-temperature magnetic sputtering technology. Experimental results showed that the negative bias voltage exhibits an important influence on the properties of TiN film. The addition of negative bias voltage resulted in a significant increase of substrate temperature, decrease of grain size , increase of hardness, improvement of luster, and increase of adhesive strength. In addition, the negative bias voltage resulted also in a negative influence, that is, the rougher film surface. Accordingly, it showed a great effect on the wear properties of the TiN film.
出处
《中国表面工程》
EI
CAS
CSCD
2005年第5期20-23,27,共5页
China Surface Engineering
关键词
低温
磁控溅射
负偏压
TIN薄膜
low temperature
magnetic sputtering
negative bias voltage
TiN film
作者简介
白秀琴（1976-）,女（汉）,江西临川人,讲师,博士生.地址：武汉理工大学可靠性工程研究所 430063 Tel： （027） 86540357 E-mail： xqbai@mail.whut.edu.cn
