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离子辅助沉积中离子束流密度的作用 被引量:17

The Effect of ion Current Density in ion Beam Assisted Deposition
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摘要 测量了EndHall离子源在不同条件下的离子束流密度,在不同离子束流密度下进行了Ar离子辅助沉积ZrO2薄膜的实验,研究了离子束流密度对薄膜折射率、晶相的影响根据动量传递模型分析了离子束流密度对薄膜折射率的作用; The ion current density (ICD) of End-Hall ion source at different conditions were determined with a Frady cup. The ZrO_2 films were deposited with different Ar+ ICD. The influence of ICD on refractive index, crystal phases, index inhomogeneity of films was studied. The effect of ICD on refractive index was analysed by a momentum transfer model. According to a thermal-spike theory, it is evidenced that the ICD didn′t influence the crystal structure of the films.
出处 《光子学报》 EI CAS CSCD 北大核心 2005年第3期477-480,共4页 Acta Photonica Sinica
基金 863资助项目(编号8638042)
关键词 离子辅助 离子束流密度 热尖峰 晶相 Ion beam assisted Ion current density Thermal-spike Crystal phase
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参考文献15

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二级参考文献14

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